-
2
-
-
79953710873
-
-
DOI: 10.1117/12.850965
-
M. Kinch, H.F. Schaake, R.L. Strong, P.K. Liao, M.J. Ohlson, J. Jacques, C.-F. Wan, D. Chandra, R.D. Burford, C.A. Schaake, Proc. SPIE 7660-83 (2010). DOI: 10.1117/12.850965.
-
(2010)
Proc. SPIE 7660-83
-
-
Kinch, M.1
Schaake, H.F.2
Strong, R.L.3
Liao, P.K.4
Ohlson, M.J.5
Jacques, J.6
Wan, C.-F.7
Chandra, D.8
Burford, R.D.9
Schaake, C.A.10
-
3
-
-
80053003408
-
-
DOI: 10.1117/12.884009
-
R. Breiter, J. Wendler, H. Lutz, S. Rutzinger, T. Ihle, J. Ziegler, I. Rühlich, Proc. SPIE 8012-88 (2011). DOI: 10.1117/12.884009.
-
(2011)
Proc. SPIE 8012-88
-
-
Breiter, R.1
-
6
-
-
1342268773
-
-
10.1117/12.515419 10.1117/12.486880 1:CAS:528:DC%2BD3sXotlWms7o%3D
-
P. Castelein, F. Marion, J.L. Martin, J. Baylet, N. Moussy, O. Gravrand, A. Durand, J.P. Chamonal, G. Destefanis, Proc. SPIE 5074, 52 (2003). DOI: 10.1117/12.515419.
-
(2003)
Proc. SPIE
, vol.5074
, pp. 52
-
-
Castelein, P.1
Marion, F.2
Martin, J.L.3
Baylet, J.4
Moussy, N.5
Gravrand, O.6
Durand, A.7
Chamonal, J.P.8
Destefanis, G.9
-
7
-
-
34548290889
-
-/p ion implantation technology
-
DOI 10.1007/s11664-007-0151-3
-
O. Gravrand, E. De Borniol, L. Mollard, G. Destefanis, J. Electron. Mater. 36, 981 (2007). DOI: 10.1007/s11664-007-0151-3. (Pubitemid 47319321)
-
(2007)
Journal of Electronic Materials
, vol.36
, Issue.8
, pp. 981-987
-
-
Gravrand, O.1
De Borniol, E.2
Bisotto, S.3
Mollard, L.4
Destefanis, G.5
-
8
-
-
68749105668
-
-
10.1007/s11664-009-0795-2 10.1007/s11664-009-0795-2 1:CAS:528: DC%2BD1MXpsVehur0%3D
-
O. Gravrand, L. Mollard, C. Largeron, N. Baier, E. Deborniol, Ph. Chorier, J. Electron. Mater. 38, 1733 (2009). DOI: 10.1007/s11664-009-0795-2.
-
(2009)
J. Electron. Mater.
, vol.38
, pp. 1733
-
-
Gravrand, O.1
Mollard, L.2
Largeron, C.3
Baier, N.4
Deborniol, E.5
Chorier, P.6
-
9
-
-
69949158572
-
-
10.1117/12.820343
-
N. Baier, L. Mollard, J. Rothman, G. Destefanis, P. Ballet, G. Bourgeois, J.P. Zanatta, M. Tchagaspanian, S. Courtas, P. Fougères, C. Pautet, P. Pidancier, L. Rubaldo, Proc. SPIE 7298, 23 (2009). DOI: 10.1117/12.820343.
-
(2009)
Proc. SPIE
, vol.7298
, pp. 23
-
-
Baier, N.1
Mollard, L.2
Rothman, J.3
Destefanis, G.4
Ballet, P.5
Bourgeois, G.6
Zanatta, J.P.7
Tchagaspanian, M.8
Courtas, S.9
Fougères, P.10
Pautet, C.11
Pidancier, P.12
Rubaldo, L.13
-
10
-
-
51849098291
-
-
10.1007/s11664-008-0426-3 10.1007/s11664-008-0426-3 1:CAS:528: DC%2BD1cXhtVOrtLbE
-
W.E. Tennant, D. Lee, M. Zandian, E. Piquette, M. Carmody, J. Electron. Mater. 37, 1406-1410 (2008). DOI: 10.1007/s11664-008-0426-3.
-
(2008)
J. Electron. Mater.
, vol.37
, pp. 1406-1410
-
-
Tennant, W.E.1
Lee, D.2
Zandian, M.3
Piquette, E.4
Carmody, M.5
-
11
-
-
84901337125
-
-
DOI: 10.1117/12.921855
-
N. Baier, L. Mollard, O. Gravrand, G. Bourgeois, J-P. Zanatta, G. Destefanis, P. Pidancier, P. Chorier, L. Tauziède, A. Bardoux, N. Baier, Proc. SPIE 8353-85 (2012). DOI: 10.1117/12.921855.
-
(2012)
Proc. SPIE 8353-85
-
-
Baier, N.1
-
12
-
-
80455127118
-
-
DOI: 10.1117/12.898987
-
B. Fieque, E. Sanson, L. Martineau, P. Chorier, O. Boulade, V. Moreau, H. Geoffray, Proc. SPIE 8176-55 (2011). DOI: 10.1117/12.898987.
-
(2011)
Proc. SPIE 8176-55
-
-
Fieque, B.1
Sanson, E.2
Martineau, L.3
Chorier, P.4
Boulade, O.5
Moreau, V.6
Geoffray, H.7
-
14
-
-
84868516833
-
-
DOI: 10.1007/s11664-012-2181-8
-
O. Gravrand, L. Mollard, O. Boulade, V. Moreau, E. Sanson, G. Destefanis, J. Electron. Mater. 41, 2686 (2012). DOI: 10.1007/s11664-012-2181-8.
-
(2012)
J. Electron. Mater.
, vol.41
, pp. 2686
-
-
Gravrand, O.1
Mollard, L.2
Boulade, O.3
Moreau, V.4
Sanson, E.5
Destefanis, G.6
-
15
-
-
3042747316
-
-
10.1007/s11664-004-0058-1 10.1007/s11664-004-0058-1 1:CAS:528: DC%2BD2cXlt1Kru7s%3D
-
M. Kinch, J.D. Beck, C.-F. Wan, F. Ma, J. Campbell, J. Electron. Mater. 33, 630 (2004). DOI: 10.1007/s11664-004-0058-1.
-
(2004)
J. Electron. Mater.
, vol.33
, pp. 630
-
-
Kinch, M.1
Beck, J.D.2
Wan, C.-F.3
Ma, F.4
Campbell, J.5
-
16
-
-
34548221000
-
HgCdTe MWIR back-illuminated electron-initiated avalanche photodiode arrays
-
DOI 10.1007/s11664-007-0172-y
-
M. Reine, J.W. Marciniec, K.K. Wong, T. Parodos, J.D. Mullarkey, P.A. Lamarre, S.P. Tobin, K.A. Gustavsen, G.M. Williams, J. Electron. Mater. 36, 1059 (2007). DOI: 10.1007/s11664-007-0172-y. (Pubitemid 47319332)
-
(2007)
Journal of Electronic Materials
, vol.36
, Issue.8
, pp. 1059-1067
-
-
Reine, M.B.1
Marciniec, J.W.2
Wong, K.K.3
Parodos, T.4
Mullarkey, J.D.5
Lamarre, P.A.6
Tobin, S.P.7
Gustavsen, K.A.8
Williams, G.M.9
-
17
-
-
51849134583
-
-
10.1007/s11664-008-0449-9 10.1007/s11664-008-0449-9 1:CAS:528: DC%2BD1cXhtVOrtLfJ
-
J. Rothman, G. Perrais, P. Ballet, L. Mollar, S. Gout, J.-P. Chamonal, J. Electron. Mater. 37, 1303 (2008). DOI: 10.1007/s11664-008-0449-9.
-
(2008)
J. Electron. Mater.
, vol.37
, pp. 1303
-
-
Rothman, J.1
Perrais, G.2
Ballet, P.3
Mollar, L.4
Gout, S.5
Chamonal, J.-P.6
-
18
-
-
80051579204
-
-
10.1007/s11664-011-1679-9
-
J. Rothman, L. Mollard, S. Gout, L. Bonnefond, J. Wlassow, J. Electron. Mater. 44, 1557 (2011). DOI: 10.1007/s11664-011-1679-9.
-
(2011)
J. Electron. Mater.
, vol.44
, pp. 1557
-
-
Rothman, J.1
Mollard, L.2
Gout, S.3
Bonnefond, L.4
Wlassow, J.5
-
19
-
-
34548234966
-
Gain and dark current characteristics of planar HgCdTe avalanche photo diodes
-
DOI 10.1007/s11664-007-0147-z
-
G. Perrais, O. Gravrand, J. Baylet, G. Destefanis, J. Rothman, J. Electron. Mater. 36, 963 (2007). DOI: 10.1007/s11664-007-0147-z. (Pubitemid 47319319)
-
(2007)
Journal of Electronic Materials
, vol.36
, Issue.8
, pp. 963-970
-
-
Perrais, G.1
Gravrand, O.2
Baylet, J.3
Destefanis, G.4
Rothman, J.5
-
20
-
-
51849121139
-
-
10.1007/s11664-008-0459-7 10.1007/s11664-008-0459-7 1:CAS:528: DC%2BD1cXhtVOrtLfL
-
G. Perrais, J. Rothman, G. Destefanis, J.P. Chamonal, J. Electron. Mater. 37, 1261 (2008). DOI: 10.1007/s11664-008-0459-7.
-
(2008)
J. Electron. Mater.
, vol.37
, pp. 1261
-
-
Perrais, G.1
Rothman, J.2
Destefanis, G.3
Chamonal, J.P.4
-
21
-
-
84868596222
-
-
10.1007/s11664-012-2087-5 10.1007/s11664-012-2087-5 1:CAS:528: DC%2BC38XhtlamsbnP
-
A. Kerlain, G. Bonnouvrier, L. Rubaldo, G. Decaens, Y. Reibel, P. Abraham, J. Rothman, L. Mollard, E. De Borniol, J. Electron. Mater. 41, 2943 (2012). DOI: 10.1007/s11664-012-2087-5.
-
(2012)
J. Electron. Mater.
, vol.41
, pp. 2943
-
-
Kerlain, A.1
Bonnouvrier, G.2
Rubaldo, L.3
Decaens, G.4
Reibel, Y.5
Abraham, P.6
Rothman, J.7
Mollard, L.8
De Borniol, E.9
-
22
-
-
84871819614
-
-
DOI: 10.1117/12.921869
-
G. Vojetta, F. Guellec, L. Matthieu, K. Foubert, P. Feautrier, J. Rothman, Proc. SPIE 83750Y (2012). DOI: 10.1117/12.921869.
-
(2012)
Proc. SPIE 83750Y
-
-
Vojetta, G.1
Guellec, F.2
Matthieu, L.3
Foubert, K.4
Feautrier, P.5
Rothman, J.6
-
23
-
-
80053001818
-
-
DOI: 10.1117/12.885583
-
Y. Reibel, F. Chabuel, C. Vaz, D. Billon-Lanfrey, J. Baylet, O. Gravrand, P. Ballet, G. Destefanis, Proc. SPIE 8012-101 (2011). DOI: 10.1117/12.885583.
-
(2011)
Proc. SPIE 8012-101
-
-
Reibel, Y.1
Chabuel, F.2
Vaz, C.3
Billon-Lanfrey, D.4
Baylet, J.5
Gravrand, O.6
Ballet, P.7
Destefanis, G.8
|