SCOPUS 정보 검색 플랫폼

ACS Symposium Series

Volumn 1062, Issue , 2011, Pages 141-165

Formation, structure, and reactivity of amino-terminated organic films on silicon substrates

(1) Kim, Joonyeong a

a UNIVERSITY AT BUFFALO (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL MODIFICATION; CURING; DEPOSITION; ESTERIFICATION; ESTERS; FLUORESCENCE MICROSCOPY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; SILICON WAFERS; SOLUTIONS; TOLUENE;

3-AMINOPROPYLTRIETHOXYSILANE; AMINO-TERMINATED; DEPOSITION TIME; N-HYDROXYSUCCINIMIDE; NON-COVALENT INTERACTION; PREPARATION CONDITIONS; SILICON SUBSTRATES; TOLUENE SOLUTION;

FILM PREPARATION;

EID: 84887078391 PISSN: 00976156 EISSN: 19475918 Source Type: Book Series
DOI: 10.1021/bk-2011-1062.ch006 Document Type: Conference Paper

Times cited : (8)

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