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Semiconductor Science and Technology

Volumn 28, Issue 11, 2013, Pages

Growth and characterization of electrodeposited Cu2O thin films

(7) Laidoudi, S a Bioud, A Y a Azizi, A a Schmerber, G b Bartringer, J b Barre, S b Dinia, A b

a FERHAT ABBAS UNIVERSITY (Algeria)

b UNIVERSITÉ DE STRASBOURG (France)

Author keywords

[No Author keywords available]

Indexed keywords

APPLIED POTENTIALS; DEPOSITION POTENTIAL; FLAT-BAND POTENTIALS; FLUORINE DOPED TIN OXIDE (FTO); OPTICAL MEASUREMENT; P TYPE SEMICONDUCTOR; SULFATE SOLUTIONS; X-RAY DIFFRACTION MEASUREMENTS;

ATOMIC FORCE MICROSCOPY; CHELATION; CRYSTALLITES; CYCLIC VOLTAMMETRY; DEPOSITION; ELECTRODEPOSITION; NANOCOMPOSITES; OPTICAL DATA PROCESSING; SUBSTRATES; X RAY DIFFRACTION;

THIN FILMS;

EID: 84887049925 PISSN: 02681242 EISSN: 13616641 Source Type: Journal
DOI: 10.1088/0268-1242/28/11/115005 Document Type: Article

Times cited : (80)

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