Electrochemical oxidation of sulphamerazine at boron-doped diamond electrodes: Influence of boron concentration

Physica Status Solidi (A) Applications and Materials Science

Volumn 210, Issue 10, 2013, Pages 2040-2047

  Fabiańska, Aleksandra ^a   Bogdanowicz, Robert ^b   Ziȩba, Patrycja ^a   Ossowski, Tadeusz ^a   Gnyba, Marcin ^b   Ryl, Jacek ^b   Zielinski, Artur ^b   Janssens, Stoffel D ^c   Haenen, Ken ^c   Siedlecka, Ewa M ^a  

^a UNIVERSITY OF GDA SK   (Poland)

^b GDANSK UNIVERSITY OF TECHNOLOGY   (Poland)

^c HASSELT UNIVERSITY   (Belgium)

Author keywords

boron doped diamond electrode; electrochemical oxidation; microwave plasma chemical vapour deposition; sulphametoxazole degradation

Indexed keywords

BORON CONCENTRATIONS; BORON-DOPED DIAMOND ELECTRODES; CHEMICAL VAPOUR DEPOSITION; DEGRADATION PROCESS; ELECTRODE MATERIAL; ELECTRODE MORPHOLOGY; HIGH-RESOLUTION SCANNING ELECTRON MICROSCOPIES; OXIDATIVE SPECIES;

CHEMICAL VAPOR DEPOSITION; DIAMOND FILMS; ELECTROCHEMICAL ELECTRODES; FREE RADICALS; PLASMA CVD; SCANNING ELECTRON MICROSCOPY;

ELECTROCHEMICAL OXIDATION;

EID: 84886096853     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.201300094     Document Type: Article

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