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Volumn 50, Issue 4, 2013, Pages 201-206
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Electrical characterization and reliability assessment of double-gate FinFETs
a,b a,c a a,d a e a a a a a a a a
e
IBM
(United States)
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Author keywords
[No Author keywords available]
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Indexed keywords
ELECTRON MOBILITY;
FINFET;
GATE DIELECTRICS;
HAFNIUM COMPOUNDS;
NANOELECTRONICS;
NEGATIVE BIAS TEMPERATURE INSTABILITY;
PHOTONICS;
SILICON ON INSULATOR TECHNOLOGY;
TITANIUM COMPOUNDS;
ELECTRICAL CHARACTERIZATION;
MOBILITY DEPENDENCES;
NEGATIVE BIAS TEMPERATURE INSTABILITY (NBTI);
ORIENTATION DEPENDENCE;
PERFORMANCE AND RELIABILITIES;
POLYSILICON ELECTRODES;
RELIABILITY ASSESSMENTS;
SILICON ON INSULATOR (SOI);
DIELECTRIC MATERIALS;
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EID: 84885826084
PISSN: 19385862
EISSN: 19386737
Source Type: Conference Proceeding
DOI: 10.1149/05004.0201ecst Document Type: Conference Paper |
Times cited : (2)
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References (18)
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