The characteristics of carbon nanotubes grown at low temperature for electronic device application

Thin Solid Films

Volumn 546, Issue , 2013, Pages 81-84

  Park, Yong Seob ^a   Yi, Junsin ^b   Lee, Jaehyeong ^b  

^a Chosun College of Science and Technology   (South Korea)

^b Sungkyunkwan University   (South Korea)

Author keywords

Carbon nanotubes; Deposition; Microwave plasma enhanced chemical vapor; Sheet resistance; Substrate temperature

Indexed keywords

CARBON; CARBON NANOTUBES; CATALYSTS; DEPOSITION; ELECTRON MICROSCOPY; ELECTRONIC EQUIPMENT; FIELD EMISSION MICROSCOPES; GLASS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; MICROWAVES; MULTIWALLED CARBON NANOTUBES (MWCN); NANOTUBES; NICKEL; PLASMA CVD; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SCANNING PROBE MICROSCOPY; SHEET RESISTANCE; TEMPERATURE; THERMOELECTRIC EQUIPMENT; TRANSMISSION ELECTRON MICROSCOPY; VAPOR DEPOSITION; YARN;

BAMBOO LIKE STRUCTURE; CHEMICAL VAPOR; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; FLEXIBLE ELECTRONIC DEVICES; FOUR-POINT PROBE METHOD; MICROWAVE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITIONS; R.F. MAGNETRON SPUTTERING; SUBSTRATE TEMPERATURE;

SUBSTRATES;

EID: 84885326099     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2013.06.069     Document Type: Conference Paper

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