Development of triode type RF plasma enhanced CVD equipment for low temperature growth of carbon nanotube

Diamond and Related Materials

Volumn 14, Issue 11-12, 2005, Pages 1848-1851

  Show, Yoshiyuki ^a   Yabe, Yutaka ^a   Izumi, Tomio ^a   Yamauchi, Hidehiko ^b  

^a TOKAI UNIVERSITY   (Japan)

^b Eiko Engineering Company Limited   (Japan)

Author keywords

Carbon nanotube; RF plasma enhanced CVD; SEM; TEM

Indexed keywords

GLASS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY; TRIODES;

GLASS SUBSTRATES; GRID ELECTRODES;

CARBON NANOTUBES;

EID: 27744511784     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2005.06.002     Document Type: Conference Paper

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