SCOPUS 정보 검색 플랫폼

Volumn 200, Issue 10 SPEC. ISS., 2006, Pages 3220-3223

Pressure effect of low-temperature growth of multi-wall carbon nanotubes on Nickel catalyst/barrier-coated glass by thermal-CVD

(7) Li, C H a Tseng, S C a Lo, S C b Chen, K F a Juang, Z Y a Leou, K C a Tsai, C H a

a NATIONAL TSING HUA UNIVERSITY (Taiwan)

b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (Taiwan)

Author keywords

Carbon nanotube; Field emission; Thermal CVD

Indexed keywords

AMORPHOUS MATERIALS; CATALYSTS; CHEMICAL VAPOR DEPOSITION; CHROMIUM; GLASS; NICKEL; PRESSURE EFFECTS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; SYNTHESIS (CHEMICAL); TRANSMISSION ELECTRON MICROSCOPY;

GLASS SUBSTRATE; MULTI-WALL CARBON NANOTUBE; THERMAL CHEMICAL VAPOR DEPOSITION;

CARBON NANOTUBES;

AMORPHOUS MATERIALS; CARBON NANOTUBES; CATALYSTS; CHEMICAL VAPOR DEPOSITION; CHROMIUM; GLASS; NICKEL; PRESSURE EFFECTS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; SYNTHESIS (CHEMICAL); TRANSMISSION ELECTRON MICROSCOPY;

EID: 31644450798 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2005.12.001 Document Type: Article

Times cited : (11)

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