Ga-doped ZnO thin films: Effect of deposition temperature, dopant concentration, and vacuum-thermal treatment on the electrical, optical, structural and morphological properties

Materials Science and Engineering: B

Volumn 134, Issue 1, 2006, Pages 20-26

  Gomez H ^a   de la L Olvera, M ^a  

^a DEPARTAMENTO DE FÍSICA   (Mexico)

Author keywords

Semiconductor oxide; Spray pyrolysis; Thin films; Vacuum annealing treatment; Zinc oxide

Indexed keywords

ANNEALING; DEPOSITION; DOPING (ADDITIVES); GALLIUM; HALL EFFECT; PYROLYSIS; SCANNING ELECTRON MICROSCOPY; VACUUM APPLICATIONS; X RAY DIFFRACTION; ZINC OXIDE;

DEPOSITION TEMPERATURE; SEMICONDUCTOR OXIDES; SPRAY PYROLYSIS; VACUUM ANNEALING TREATMENT;

THIN FILMS;

EID: 33749236387     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2006.07.039     Document Type: Review

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