Effects of annealing and plasma treatment on the electrical and optical properties of spin-coated ITZO films

Journal of Alloys and Compounds

Volumn 583, Issue , 2014, Pages 535-538

  Lee, Dong Min ^a,d   Kim, Jae Kwan ^a   Hao, Jinchen ^b   Kim, Han Ki ^b   Yoon, Jae Sik ^c   Lee, Ji Myon ^a  

^a Sunchon National University   (South Korea)

^b Kyung Hee University   (South Korea)

^c Korea Basic Science Institute (KBSI)   (South Korea)

^d Sapphire Artists Co Ltd   (South Korea)

Author keywords

ITO; ITZO; Plasma treatment; Spin coating

Indexed keywords

ELECTRICAL AND OPTICAL PROPERTIES; HYDROGEN PLASMA TREATMENTS; INDUCTIVELY-COUPLED; ITO; ITZO; OPTICAL AND ELECTRICAL PROPERTIES; PLASMA TREATMENT; SOLUTION-PROCESSED;

ANNEALING; COATINGS; ELECTROMAGNETIC INDUCTION; METAL ANALYSIS; PLASMA APPLICATIONS; SHEET RESISTANCE; TIN OXIDES;

ELECTRIC PROPERTIES;

EID: 84884638717     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2013.09.008     Document Type: Article

References (22)

1. C.G. Granqvist Appl. Phys. A. 52 1991 83
2. H. Sato, T. Minami, S. Takata, T. Miyata, and M. Ishii Thin Solid Films 102 1983
3. I. Hambergend, and C.G. Granquist J. Appl. Phys. 60 1986 R123
4. G. Haacke Annu. Rev. Mater. Sci. 7 1977 73
5. H. Kim, J.S. Horwitz, G.P. Kushto, Z.H. Kafafi, and D.B. Chrisey Appl. Phys. Lett. 79 2001 284
6. R.B.H. Tahar, T. Ban, Y. Ohya, and Y. Takahashi J. Appl. Phys. 83 1998 2631
7. H.K. Kim, and K.S. Lee Electrochem. Solid-State Lett. 11 2008 J57
8. S.S. Kim, S.Y. Choi, C.G. Park, and H.W. Jin Thin Solid Films 347 1999 155
9. B. Kang, L.W. Tan, and S.R. Silva Appl. Phys. Lett. 93 2008 133302
10. J. Xue, S. Uchida, B.P. Rand, and S.R. Forrest Appl. Phys. Lett. 84 2004 3013
11. K.H. Choi, J.A. Jeong, J.W. Kang, D.G. Kim, J.K. Kim, S.I. Na, D.Y. Kim, S.S. Kim, and H.K. Kim Sol. Energy Mater. Sol. Cells 93 2009 1248
12. C. Jin, I.K. You, and H.K. Kim Curr. Appl. Phys. 13 2013 S177
13. C.G. Van de Walle Phys. Rev. Lett. 85 2000 1012
14. J.M. Lee, K.K. Kim, S.J. Park, and W.K. Choi Appl. Phys. Lett. 78 2001 3842
15. J.M. Lee, K.M. Chang, K.K. Kim, W.K. Choi, and S.J. Park J. Electrochem. Soc. 148 2001 G1
16. Y.F. Lu, H.Q. Ni, Z.H. Mai, and Z.M. Ren J. Appl. Phys. 88 2000 498
17. M. Chen, Z.L. Pei, C. Sun, L.S. Wen, and X. Wang J. Cryst. Growth 220 2000 254
18. G.H. Kim, H.S. Kim, H.S. Shin, B.D. Ahn, K.H. Kim, and H.J. Kim Thin Solid Films 517 2009 4007
19. S.H. Yang, D.M. Lee, J.K. Kim, J.W. Kang, and J.M. Lee J. Phys. D 46 2013 125103
20. W. Kim, J.H. Bang, H.S. Uhm, S.H. Lee, and J.S. Park Thin Solid Films 519 2010 1573
21. J. Tauc, R. Grigorovici, and A. Vancu Phys. Status Solidi (b) 15 1966 627
22. B.E. Semelius, K.F. Berggren, Z.C. Jin, I. Hamberg, and C.G. Granqvist Phys. Rev. B 37 1988 10244