Effect of rapid thermal annealing on the properties of spin-coated In-Zn-Sn-O films

Current Applied Physics

Volumn 13, Issue 4 SUPPL.2, 2013, Pages

  Jin, Chenhao ^a   You, In Kyu ^b   Kim, Han Ki ^a  

^a Kyung Hee University   (South Korea)

^b Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

In Zn Sn O; Rapid thermal annealing; Spin coating; Transparent electrodes

Indexed keywords

COATINGS; FILM PREPARATION; INDIUM COMPOUNDS; OPTOELECTRONIC DEVICES; SPIN COATING; SPIN GLASS; SUBSTRATES; TIN COMPOUNDS; TRANSPARENT ELECTRODES; ZINC COMPOUNDS;

COATING PRINTING; ELECTRICAL , OPTICAL AND STRUCTURAL PROPERTIES; GLASS SUBSTRATES; IN-ZN-SN-O; NITROGEN AMBIENT; RAPID THERMAL ANNEALING (RTA); SPIN COATING PROCESS; WORKING PRESSURES;

RAPID THERMAL ANNEALING;

EID: 84886375895     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2012.12.015     Document Type: Article

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