Effect of introducing H2O vapor on properties of RF sputter-grown ITO anode layer for OLEDs

Electrochemical and Solid-State Letters

Volumn 11, Issue 6, 2008, Pages

  Kim, Han Ki ^a   Lee, Kyu Sung ^b  

^a Kumoh National Institute of Technology   (South Korea)

^b Samsung SDI   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC POTENTIAL; MASS SPECTROMETERS; ORGANIC LIGHT EMITTING DIODES (OLED); SPUTTERING;

HIGHER TRANSMITTANCE; INDIUM TIN OXIDE (ITO);

WATER VAPOR;

EID: 42349107840     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2906134     Document Type: Article

References (9)

1. J. S. Kim, M. Granstrom, R. H. Friend, N. Johansson, W. R. Salaneck, R. Daik, W. J. Feast, and F. Cacialli, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.368981, 84, 6859 (1998).
2. B. H. Tahar, T. Ban, Y. Ohya, and Y. Takahashi, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.367025, 83, 2631 (1998).
3. G. Liu, J. B. Kerr, and S. Johnson, Synth. Met. SYMEDZ 0379-6779 10.1016/j.synthmet.2004.01.011, 144, 1 (2004).
4. H.-K. Kim, D.-G. Kim, K.-S. Lee, M.-S. Hur, S. H. Jeong, K. I. Kim, and T.-Y. Seong, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1923182, 86, 183503 (2005).
5. S. Ishibashi, Y. Higuchi, Y. Ota, and K. Nakamura, J. Vac. Sci. Technol. A JVTAD6 0734-2101 10.1116/1.576889, 8, 1399 (1990).
6. E. Nishimura, H. Ohkawa, P. K. Song, and Y. Shigesato, Thin Solid Films THSFAP 0040-6090 10.1016/S0040-6090(03)01168-4, 445, 235 (2003).
7. P. Thilakan, C. Minarini, S. Loreti, and E. Terzini, Thin Solid Films THSFAP 0040-6090 10.1016/S0040-6090(01)00820-3, 388, 34 (2001).
8. Y. Shigesato, I. Yasui, Y. Hayashi, S. Takaki, T. Oyama, and M. Kamei, J. Vac. Sci. Technol. A JVTAD6 0734-2101 10.1116/1.579409, 13, 268 (1995).
9. J.-H. Bae, J.-M. Moon, H.-K. Kim, J.-W. Kang, H.-D. Park, J.-J. Kim, and W. J. Cho, J. Electrochem. Soc. JESOAN 0013-4651 10.1149/1.2426800, 154, J81 (2007).