Real-time monitoring of nanoparticle film growth at high deposition rate with optical spectroscopy of plasmon resonances

Journal of Physics D: Applied Physics

Volumn 46, Issue 37, 2013, Pages

  Grachev, Sergey ^a   Grazia, Marco De ^a   Barthel, Etienne ^a   Søndergård, Elin ^a   Lazzari, Rémi ^b  

^a Unite Mixte CNRS   (France)

^b SORBONNE UNIVERSITÉ   (France)

Author keywords

[No Author keywords available]

Indexed keywords

HIGH DEPOSITION RATES; NUCLEATION AND GROWTH; PARTICLE ASPECT RATIOS; PHYSICAL VAPOUR DEPOSITION; SPUTTERING DEPOSITION; STICKING COEFFICIENTS; SUBSTRATE TEMPERATURE; SURFACE DIFFERENTIALS;

ALUMINA; ASPECT RATIO; DEPOSITION; FILM GROWTH; PHYSICAL VAPOR DEPOSITION;

SILVER;

EID: 84884569383     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/46/37/375305     Document Type: Article

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