Preparation and characterization of electrodeposited SnS thin films

Optik

Volumn 122, Issue 24, 2011, Pages 2216-2219

  Mariappan, R ^a   Mahalingam, T ^b   Ponnuswamy, V ^a  

^a SRI RAMAKRISHNA MISSION VIDYALAYA COLLEGE OF ARTS AND SCIENCE   (India)

^b ALAGAPPA UNIVERSITY   (India)

Author keywords

Optical properties; SEM; SnS thin films; X ray diffraction

Indexed keywords

CATHODIC POTENTIALS; COATED GLASS SUBSTRATES; DEPOSITED FILMS; DIRECT BAND GAP; DISLOCATION DENSITIES; FOURIER TRANSFORM INFRARED; FTIR; INDIUM DOPED TIN OXIDES; MICRO-STRAIN; MICROSTRUCTURAL PARAMETERS; PREFERENTIAL ORIENTATION; SATURATED CALOMEL ELECTRODE; SEM STUDY; SNS FILMS; SNS THIN FILMS; TIN SULFIDE;

CRACK PROPAGATION; CRYSTAL ORIENTATION; CRYSTALLITE SIZE; DISLOCATIONS (CRYSTALS); DOPING (ADDITIVES); ELECTRODEPOSITION; INDIUM SULFIDE; ITO GLASS; OPTICAL PROPERTIES; OXIDE FILMS; SCANNING ELECTRON MICROSCOPY; SODIUM; SUBSTRATES; THIN FILMS; TIN; TIN OXIDES; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

FILM PREPARATION;

EID: 82255175182     PISSN: 00304026     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ijleo.2011.01.015     Document Type: Article

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