Deep-ultraviolet Raman investigation of silicon oxide: Thin film on silicon substrate versus bulk material

Advances in Natural Sciences: Nanoscience and Nanotechnology

Volumn 3, Issue 4, 2012, Pages

  Borowicz, Paweł ^a,b   Latek, Mariusz ^a   Rzodkiewicz, Witold ^a   Łaszcz, Adam ^a   Czerwinski, Andrzej ^a   Ratajczak, Jacek ^a  

^a ukasiewicz Research Network Institute of Microelectronics and Photonics   (Poland)

^b INSTITUTE OF PHYSICAL CHEMISTRY   (Poland)

Author keywords

Mechanical stress; MOS structure; Oxide film; Raman scattering

Indexed keywords

LITHOGRAPHY; MATERIALS HANDLING EQUIPMENT; METALS; MOS DEVICES; OXIDE FILMS; OXIDE SEMICONDUCTORS; PHONON SCATTERING; PHONONS; RAMAN SCATTERING; RAMAN SPECTROSCOPY; SILICON COMPOUNDS; SILICON OXIDES; THIN FILMS;

EXPERIMENTAL TECHNIQUES; MECHANICAL STRESS; MECHANICAL STRESS DISTRIBUTIONS; METAL OXIDE SEMICONDUCTOR; MOS STRUCTURE; SILICON-BASED ELECTRONICS; SIMULTANEOUS MEASUREMENT; STRUCTURAL INVESTIGATION;

SUBSTRATES;

EID: 84884226867     PISSN: None     EISSN: 20436262     Source Type: Journal    
DOI: 10.1088/2043-6262/3/4/045003     Document Type: Article

References (24)

1. Temple P A and Hathaway C E 1973 Phys. Rev. B 7 3685
2. Chabli A 1998 Microelectron. Eng. 40 263
3. De Wolf I, Jian Ch and van Spengen W M 2001 Opt. Lasers Eng. 36 213
4. Stoney G G 1909 The tension of metallic films deposited by electrolysis Proc. R. Soc. Lon., A 82 172
5. Revesz A G and Hughes H L 2003 J. Non-Cryst. Solids 328 48
6. Walrafen G E and Krishnan P N 1981 J. Chem. Phys. 74 5328
7. Przewłocki H M, Kudła A, Piskorski K and Brzezi'nska D 2008 Thin Solid Films 516 4184
8. Walrafen G E, Krishnan P N and Freiman S W 1981 J. Appl. Phys. 52 2832
9. Hibino Y, Hanafusa H, Ema K and Hyodo S 1985 Appl. Phys. Lett. 47 812
10. Champagnon B, Martinet C, Boudeulle M, Vouagner D, Coussa C, Deschamps T and Grosvalet L 2008 J. Non-Cryst. Solids 354 569
11. Aspnes D E and Theetn J B 1979 Phys. Rev. Lett. 43 1046
12. Herzinger C M, Johs B, McGahan W A, Woollam J A and Paulson W 1988 J. Appl. Phys. 83 3323
13. Zhao C, Lefebvre P R and Irene E A 1998 Thin Solid Films 313-314 286
14. Jasny J, Borowicz P and Nickel B 2004 J. Opt. Soc. Am. B 21 729
15. Varshni Y P 1967 Physica 34 149
16. Duverger C, Nedelec J-M, Benatsou M, Bouazaoui M, Capoen B, Ferrari M and Turrell S 1999 J. Mol. Struct. 480-481 169
17. Ivanda M, Clasen R, Hornfeck M and Kiefer W 2003 J. Non-Cryst. Solids 322 46
18. Chligui M, Guimbretière G, Canizarès A, Matzen G, Vaills Y and Simon P New Features in the Raman Spectrum of Silica: Key-points in the Improvement on Structure Knowledge (version 24 September 2010) (http://hal.archives-ouvertes.fr/docs/00/52/08/23/PDF/chliguiSiO2.pdf) accessed 2011.08.29
19. Ferrari A C 2007 Solid State Commun. 143 47
20. Maultzsch J, Reich S and Thomsen C 2004 Phys. Rev. B 70 155403
21. Shi J R, Shi X, Sun Z, Liu E, Tay B K and Lau S P 2000 Thin Solid Films 366 169
22. Yoshikawa M, Nagai N, Matsuki M, Fukuda K, Katagiri G, Ishida H, Ishitani A and Nagai I 1992 Phys. Rev. B 46 7169
23. Walrafen G E, Chu Y C and Hokmabadi M S 1990 J. Chem. Phys. 92 6987
24. Kingma K J and Hempley R J 1994 Am. Mineral. 79 269