Fabrication of oleophobic fluorocarbon film by 13.56MHz CH2F2/Ar plasma chemical vapor deposition

Surface and Coatings Technology

Volumn 231, Issue , 2013, Pages 47-52

  Huang, Chun ^a   Pan, Chien Hsuan ^a   Tsai, Ching Yuan ^a   Tseng, I Yao ^a  

^a YUAN ZE UNIVERSITY   (Taiwan)

Author keywords

Low pressure 13.56MHz plasma; Oleophobic films; Static contact angle

Indexed keywords

EXPERIMENTAL PARAMETERS; FLUOROCARBON COATINGS; LOW PRESSURES; OLEOPHOBIC; PLASMA CHEMICAL VAPOR DEPOSITION; RADIO FREQUENCY POWER; STATIC CONTACT ANGLE; SURFACE CHARACTERISTICS;

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; COATINGS; CONTACT ANGLE; ELECTRIC CONTACTS; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; ION BOMBARDMENT; PHOTOELECTRONS; PLASMA CVD; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

PLASMAS;

EID: 84882902555     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2012.05.060     Document Type: Article

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