Deposition of hydrophobic nano-coatings with low-pressure radio frequency CH2F2/Ar plasma processing

Thin Solid Films

Volumn 518, Issue 13, 2010, Pages 3570-3574

  Huang, Chun ^a   Pan, Chien Hsuan ^a   Liu, Chi Hung ^a  

^a YUAN ZE UNIVERSITY   (Taiwan)

Author keywords

Difluoromethane plasma; Hydrophobic coating; Surface characteristics; Wettability

Indexed keywords

AFM; AR PLASMAS; DIFLUOROMETHANE; DIFLUOROMETHANE PLASMA; GAS PRESSURES; HEAT-SENSITIVE MATERIALS; HYDROPHOBIC COATINGS; HYDROPHOBIC SURFACES; LOW PRESSURE PLASMA; NANO-COATINGS; OPERATIONAL PARAMETERS; PLASMA POLYMERIZED FILM; RADIO FREQUENCIES; RADIO FREQUENCY POWER; RF PLASMA; STATIC CONTACT ANGLE; SUPERHYDROPHOBIC; SURFACE CHARACTERISTICS; WATER CONTACT ANGLE;

ANGLE MEASUREMENT; ARGON; ATOMIC FORCE MICROSCOPY; COATINGS; CONTACT ANGLE; HYDROPHOBICITY; ION BOMBARDMENT; PLASMA DEVICES; PLASMA THEORY; POLYMERS; RADIO; RADIO WAVES; SURFACE CHEMISTRY; SURFACE PROPERTIES; SURFACE ROUGHNESS; WAVE PLASMA INTERACTIONS;

PLASMA DIAGNOSTICS;

EID: 77949432116     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.12.013     Document Type: Article

References (11)

1. Biloiu C., and Sakai Y. IEEE Trans. Plasma Sci. 36 (2008) 890
2. Yabu H., Takebayashi M., Tanaka M., and Shimomura M. Langmuir 22 (2006) 3081
3. Woodward I., Schofield W.C.E., Roucouled V., and Badyal J.P.S. Langmuir 19 (2003) 3432
4. Takai O., Hozumi A., and Sugimoto N. J. Non-Cryst. Solids 218 (1997) 280
5. Favia P., Cicala G., Milella A., Palumbo F., Rossini P., and d'Agostino R. Surf. Coat. Technol. 169 (2003) 609
6. Liu D., Yin Y., Li D., Niu J., and Feng Z. Thin Solid Films 517 (2009) 3656
7. Labelle C.B., and Gleason K.K. J. Appl. Polym. Sci. 74 (1999) 2439
8. Yasuda H. Luminous Chemical Vapor Deposition and Interface Engineering vol. 38 (2005), Marcel Dekker, New York
9. Liu D., Gu J., Feng Z., Li D., and Niu J. Thin Solid Films 517 (2009) 3011
10. Yu Q.S., and Yasuda H.K. J. Polym. Sci., Part A: Polym. Chem. 37 (1999) 967
11. Choi E.H., Ahn J.C., Moon M.W., Choi M.C., Seo Y., Cho G., Uhm H.S., Tachibana K., Whang K.W., and Kristiansen M. Appl. Phys. Lett. 81 (2002) 3341