Characterization of a dc atmospheric pressure normal glow discharge

Plasma Sources Science and Technology

Volumn 14, Issue 4, 2005, Pages 700-711

  Staack, David ^a   Farouk, Bakhtier ^a   Gutsol, Alexander ^a   Fridman, Alexander ^a  

^a Drexel University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANODES; ATMOSPHERIC PRESSURE; CATHODES; CURRENT VOLTAGE CHARACTERISTICS; ELECTRODES; EMISSION SPECTROSCOPY; TEMPERATURE MEASUREMENT; VISUALIZATION;

DC ATMOSPHERIC PRESSURE; GAS TEMPERATURE MEASUREMENTS; HEAT GENERATION; THERMAL INSTABILITIES;

GLOW DISCHARGES;

EID: 27744600089     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/14/4/009     Document Type: Article

References (37)

1. Kunhardt E E 2000 IEEE Trans. Plasma Sci. 28 189
2. Schutze A, Jeong J Y, Babayan S E, Park J, Selwyn G S and Hicks R F 1998 IEEE Trans. Plasma Sci. 26 1685
3. Raizer Y P 1997 Gas Discharge Physics (Berlin: Springer)
4. Fridman A and Kennedy L A 2004 Plasma Physics and Engineering (New York: Taylor and Francis)
5. Fan H Y 1939 Phys. Rev. 55 769
6. Gambling W A and Edels H 1956 Br. J. Appl. Phys. 5 36
7. Gambling W A and Edels H 1956 Br. J. Appl. Phys. 7 376
8. Yu L, Laux C O, Packan D M and Kruger C H 2002 J. Appl. Phys. 91 2678
9. Sankaran R M and Giapis K P 2001 Appl. Phys. Lett. 79 593
10. Sankaran R M and Giapis K P 2002 J. Appl. Phys. 92 2406
11. Sankaran R M and Giapis K P 2003 J. Phys. D: Appl. Phys. 36 2914
12. Sankaran R M, Giapis K P, Moselhy M and Schoenbach K H 2003 Appl. Phys. Lett. 83 4728
13. Stark R H and Schoenbach K H 1999 Appl. Phys. Lett. 74 3770
14. Schoenbach K H, Moselhy M, Shi W and Bentley R 2003 J. Vac. Sci. Technol. A 21 1260
15. Stark R H and Schoenbach K H 2001 J. Appl. Phys. 89 3568
16. Yu Z, Hoshimiya K, Williams J D, Polvinen S F and Collins G J 2003 Appl. Phys. Lett. 83 854
17. Akishev Y, Grushin M, Kochetov I, Karal'nik V and Napartovich A 2005 Plasma Sources Sci. Technol. 14 S18
18. Hsu D D and Graves D B 2003 J. Phys. D: Appl. Phys. 36 2898
19. Roth J R 1997 Industrial Plasma Engineering vol 1 (Bristol: Institute of Physics Publishing)
20. Schoenbach K H, El-Habachi A, Shi W and Ciocca M 1997 Plasma Sources Sci. Technol. 6 468
21. Petrovic Z L and Phelps A V 1993 Phys. Rev. E 47 2806
22. Laher R R and Gilmore F R 1991 J. Phys. Chem. Ref. Data 20 685
23. Laux C O, Spence T G, Kruger C H and Zare R N 2003 Plasma Sources Sci. Technol. 12 125
24. Laux C 2005 personal communication
25. Block R, Roedter O and Schoenbach K H 1999 30th Plasmadynamics and Lasers Conf. (Norfolk, VA) AIAA-99-3434
26. Lifshitz 1974 J. Chem. Phys. 61 2478
27. Tien C L and Leinhard J H 1979 Statistical Thermodynamics (New York: Taylor and Francis)
28. Kogelschatz U 2003 Plasma Chem. Plasma Process. 23 1
29. Chen J, Park S J, Fan Z F, Eden J G and Liu C 2002 J. Microelectromech. Syst. 11 536
30. Noguchi Y, Matsuoka A, Uchino K and Muraoka K 2002 J. Appl. Phys. 91 613
31. Ito T, Izaki K and Terashima K 2000 Surf. Coat. Technol. 133-134 497
32. Ito T, Izaki K and Terashima K 2001 Surf. Coat. Technol. 300-304 497
33. Ito T and Terashima K 2001 Thin Solid Films 390 234
34. Miclea M, Kunze K, Franzke J and Niemax K 2002 Spectrochim. Acta B 57 1585
35. Eijkel J C T, Stoeri H and Manz A 2000 Anal. Chem. 72 2547
36. Yin Y, Messier J and Hopwood J 1999 IEEE Trans. Plasma Sci. 27 1516
37. Park S-J and Eden J G 2002 Appl. Phys. Lett. 81 4127