-
1
-
-
85133774576
-
-
Marcel Dekker, NY, K.L. Mittal (Ed.)
-
Metallized Plastics: Fundamentals and Applications 1998, Marcel Dekker, NY. K.L. Mittal (Ed.).
-
(1998)
-
-
-
2
-
-
0009990846
-
-
E. Sacher, J. Pireaux, S.P. Kowalczyk (Eds.)
-
Kowalczyk S.P. Metallization of Polymers 1990, 10. E. Sacher, J. Pireaux, S.P. Kowalczyk (Eds.).
-
(1990)
Metallization of Polymers
, pp. 10
-
-
Kowalczyk, S.P.1
-
3
-
-
0004329383
-
-
E. Sacher (Ed.)
-
Faupel F., Zaporojtchenko V., Strunskus T., Erichsen J., Dolgner K., Thran A., Keine M. Metallization of Polymers 2002, 2:73. E. Sacher (Ed.).
-
(2002)
Metallization of Polymers
, vol.2
, pp. 73
-
-
Faupel, F.1
Zaporojtchenko, V.2
Strunskus, T.3
Erichsen, J.4
Dolgner, K.5
Thran, A.6
Keine, M.7
-
4
-
-
0034274597
-
-
Inoue Y., Inata M., Fujii M., Hayashi S., Yamamoto K. Thin Solid Films 2000, 372:169.
-
(2000)
Thin Solid Films
, vol.372
, pp. 169
-
-
Inoue, Y.1
Inata, M.2
Fujii, M.3
Hayashi, S.4
Yamamoto, K.5
-
8
-
-
0035248904
-
-
Zaporojtchenko V., Strunskus T., Erichsen J., Faupel F. Macromolecules 2001, 5:1125.
-
(2001)
Macromolecules
, vol.5
, pp. 1125
-
-
Zaporojtchenko, V.1
Strunskus, T.2
Erichsen, J.3
Faupel, F.4
-
12
-
-
85133798746
-
-
Marcel Dekker, NY, M. Ghosh, K.L. Mittal (Eds.)
-
Polyimides: Fundamental Aspects and Technological Applications 1996, Marcel Dekker, NY. M. Ghosh, K.L. Mittal (Eds.).
-
(1996)
-
-
-
14
-
-
0242411240
-
-
C. Chiang, P.S. Ho, T.-M. Lu, J. Wetzel (Eds.)
-
Low-Dielectric Constant Materials and Applications in Microelectronics IV. Mater. Res. Soc. Symp. Proc. 1998, 511. C. Chiang, P.S. Ho, T.-M. Lu, J. Wetzel (Eds.).
-
(1998)
Mater. Res. Soc. Symp. Proc.
, pp. 511
-
-
-
15
-
-
0031372934
-
-
Townsend P.H., Martin S.J., Godschalx J., Romer D.R., Smith D.W., Castillo D., deVries R., Buske G., Rondan N., Froelicher S., Marshall J., Shaffer E.O., Im J-H. Mater. Res. Soc. Symp. Proc. 1997, 476:9.
-
(1997)
Mater. Res. Soc. Symp. Proc.
, vol.476
, pp. 9
-
-
Townsend, P.H.1
Martin, S.J.2
Godschalx, J.3
Romer, D.R.4
Smith, D.W.5
Castillo, D.6
Devries, R.7
Buske, G.8
Rondan, N.9
Froelicher, S.10
Marshall, J.11
Shaffer, E.O.12
Im, J.-H.13
-
16
-
-
85133735324
-
-
May
-
Euro. Semiconductor May 2000, 7.
-
(2000)
, pp. 7
-
-
-
17
-
-
0003440116
-
-
Plenum Press, NY, L.H. Lee (Ed.)
-
Ho P.S., Haight R., White R.C., Silverman B.D., Faupel F. Fundamentals of Adhesion 1991, 383. Plenum Press, NY. L.H. Lee (Ed.).
-
(1991)
Fundamentals of Adhesion
, pp. 383
-
-
Ho, P.S.1
Haight, R.2
White, R.C.3
Silverman, B.D.4
Faupel, F.5
-
20
-
-
0001262301
-
-
Kowalczyk S.P., Kim Y.H., Walker G.F., Kim J. Appl. Phys. Lett. 1988, 52:375.
-
(1988)
Appl. Phys. Lett.
, vol.52
, pp. 375
-
-
Kowalczyk, S.P.1
Kim, Y.H.2
Walker, G.F.3
Kim, J.4
-
21
-
-
0003995912
-
-
IOP Publishing, J.J. Pireaux, P. Bertrand, J.L. Brédas (Eds.)
-
Faupel F. Polymer-Solid Interfaces 1992, 171. IOP Publishing. J.J. Pireaux, P. Bertrand, J.L. Brédas (Eds.).
-
(1992)
Polymer-Solid Interfaces
, pp. 171
-
-
Faupel, F.1
-
22
-
-
0032207612
-
-
Kiene M., Strunskus T., Peter R., Faupel F. Adv. Mater. 1998, 10:1357.
-
(1998)
Adv. Mater.
, vol.10
, pp. 1357
-
-
Kiene, M.1
Strunskus, T.2
Peter, R.3
Faupel, F.4
-
23
-
-
79956052853
-
-
Thran A., Strunskus T., Zaporojtchenko V., Faupel E. Appl. Phys. Lett. 2002, 81(2):244.
-
(2002)
Appl. Phys. Lett.
, vol.81
, Issue.2
, pp. 244
-
-
Thran, A.1
Strunskus, T.2
Zaporojtchenko, V.3
Faupel, E.4
-
24
-
-
33344478613
-
-
Springer Verlag, P.S. Ho, W.W. Lee, J. Leu (Eds.)
-
Faupel F., Thran A., Kiene M., Strunskus T., Zaporojtchenko V., Behnke K. Low Dielectric Constant Materials for IC Applications 2003, 221. Springer Verlag. P.S. Ho, W.W. Lee, J. Leu (Eds.).
-
(2003)
Low Dielectric Constant Materials for IC Applications
, pp. 221
-
-
Faupel, F.1
Thran, A.2
Kiene, M.3
Strunskus, T.4
Zaporojtchenko, V.5
Behnke, K.6
-
25
-
-
0003751296
-
-
Wiley-VCH, G. Hadziioannou, P.F. van Hutten (Eds.)
-
Semiconducting Polymers 2000, Wiley-VCH. G. Hadziioannou, P.F. van Hutten (Eds.).
-
(2000)
Semiconducting Polymers
-
-
-
26
-
-
0011336568
-
-
Ishii H., Sugiyama K., Ito E., Seki K. Adv. Mater. 1999, 11:605.
-
(1999)
Adv. Mater.
, vol.11
, pp. 605
-
-
Ishii, H.1
Sugiyama, K.2
Ito, E.3
Seki, K.4
-
28
-
-
0013064921
-
-
Strunskus T., Grunze M., Kochendoerfer G., Wöll Ch. Langmuir 1996, 12:2712.
-
(1996)
Langmuir
, vol.12
, pp. 2712
-
-
Strunskus, T.1
Grunze, M.2
Kochendoerfer, G.3
Wöll, C.4
-
29
-
-
84913042171
-
-
Clabes J.G., Goldberg M.J., Viehbeck A., Kovac C.A. J. Vac. Sci. Technol. 1988, A6:985.
-
(1988)
J. Vac. Sci. Technol.
, vol.A6
, pp. 985
-
-
Clabes, J.G.1
Goldberg, M.J.2
Viehbeck, A.3
Kovac, C.A.4
-
30
-
-
36449008499
-
-
Hirose Y., Kahn A., Aristov V., Soukiassian P. Appl. Phys. Lett. 1996, 68:217.
-
(1996)
Appl. Phys. Lett.
, vol.68
, pp. 217
-
-
Hirose, Y.1
Kahn, A.2
Aristov, V.3
Soukiassian, P.4
-
31
-
-
0021094467
-
-
Kovacs G.J., Vincett P.S., Tremblay C., Pundsack A.L. Thin Solid Films 1983, 101:21.
-
(1983)
Thin Solid Films
, vol.101
, pp. 21
-
-
Kovacs, G.J.1
Vincett, P.S.2
Tremblay, C.3
Pundsack, A.L.4
-
33
-
-
0001262301
-
-
Kowalczyk S.P., Kim Y.H., Walker G.F. J. Kim, Appl. Phys. Lett. 1988, 52:375.
-
(1988)
J. Kim, Appl. Phys. Lett.
, vol.52
, pp. 375
-
-
Kowalczyk, S.P.1
Kim, Y.H.2
Walker, G.F.3
-
34
-
-
0031251009
-
-
Godbey J., Buckley L.J., Purdy A.P., Snow A.W. Thin Solid Films 1997, 308-309:470.
-
(1997)
Thin Solid Films
, vol.308-309
, pp. 470
-
-
Godbey, J.1
Buckley, L.J.2
Purdy, A.P.3
Snow, A.W.4
-
36
-
-
0000971799
-
-
Thran A., Kiene M., Zaporojtchenko V., Faupel F. Phys. Rev. Lett. 1999, 82:1903.
-
(1999)
Phys. Rev. Lett.
, vol.82
, pp. 1903
-
-
Thran, A.1
Kiene, M.2
Zaporojtchenko, V.3
Faupel, F.4
-
37
-
-
0032635521
-
-
Zaporojtchenko V., Behnke K., Thran A., Strunskus T., Faupel F. Appl. Surf. Sci. 1999, 144-145:355.
-
(1999)
Appl. Surf. Sci.
, vol.144-145
, pp. 355
-
-
Zaporojtchenko, V.1
Behnke, K.2
Thran, A.3
Strunskus, T.4
Faupel, F.5
-
38
-
-
0034245096
-
-
Zaporojtchenko V., Behnke K., Strunskus T., Faupel F. Surf. Interf. Anal. 2000, 30:439.
-
(2000)
Surf. Interf. Anal.
, vol.30
, pp. 439
-
-
Zaporojtchenko, V.1
Behnke, K.2
Strunskus, T.3
Faupel, F.4
-
39
-
-
85133769355
-
-
Zaporojtchenko V., Erichsen J., Strunskus T., Behnke K., Faupel F., Baklanov M., Maex K. MRS Proceedings 2001, L8. 1.
-
(2001)
MRS Proceedings
, vol.L8
, pp. 1
-
-
Zaporojtchenko, V.1
Erichsen, J.2
Strunskus, T.3
Behnke, K.4
Faupel, F.5
Baklanov, M.6
Maex, K.7
-
40
-
-
84882880345
-
Metalization of Polymers
-
Kluwer Academic/Plenum Publishers, NY, E. Sacher (Ed.)
-
Zaporojtchenko V., Erichsen J., Zekonyte J., Thran A., Strunskus T., Faupel F. Metalization of Polymers. ACS Symposium Series 2002, 2:107. Kluwer Academic/Plenum Publishers, NY. E. Sacher (Ed.).
-
(2002)
ACS Symposium Series
, vol.2
, pp. 107
-
-
Zaporojtchenko, V.1
Erichsen, J.2
Zekonyte, J.3
Thran, A.4
Strunskus, T.5
Faupel, F.6
-
44
-
-
85133814963
-
Lehrbuch derAnorganischen Chemie
-
Wieberg H. Lehrbuch derAnorganischen Chemie. Walter de Gruyter 1995.
-
(1995)
Walter de Gruyter
-
-
Wieberg, H.1
-
48
-
-
0000586662
-
-
Strunskus T., Kiene M., Willecke R., Thran A., Bechtolsheim C.V., Faupel F. Mater. Corrosion 1998, 49:180.
-
(1998)
Mater. Corrosion
, vol.49
, pp. 180
-
-
Strunskus, T.1
Kiene, M.2
Willecke, R.3
Thran, A.4
Bechtolsheim, C.V.5
Faupel, F.6
-
49
-
-
84882918381
-
-
O. Kraft, E. Arzt, C.A. Volkert, P.S. Ho, H. Okabayashi (Eds.)
-
Faupel F., Thran A., Zaporojtchenko V., Keine M., Strunskus T., Behnke K. Stress-Induced Phenomena in Metallization, Stuttgart, 1999 1999, 491. O. Kraft, E. Arzt, C.A. Volkert, P.S. Ho, H. Okabayashi (Eds.).
-
(1999)
Stress-Induced Phenomena in Metallization, Stuttgart, 1999
, pp. 491
-
-
Faupel, F.1
Thran, A.2
Zaporojtchenko, V.3
Keine, M.4
Strunskus, T.5
Behnke, K.6
-
50
-
-
0006420492
-
-
Meyer H.M., Anderson S.G., Atanasoska L., Weaver J.H. J. Vac. Sci. Technol. 1988, A6(30):1002.
-
(1988)
J. Vac. Sci. Technol.
, vol.A6
, Issue.30
, pp. 1002
-
-
Meyer, H.M.1
Anderson, S.G.2
Atanasoska, L.3
Weaver, J.H.4
-
57
-
-
84882890572
-
Metallization of Polymers
-
Kluwer Academic/ Publishers, NY, E. Sacher (Ed.)
-
Walker A.V., Fisher G.L., Hooper A.E., Tighe T., Opila R., Winograd N., Allara D.L. Metallization of Polymers. ACS Symposium Series 2002, 2:117. Kluwer Academic/ Publishers, NY. E. Sacher (Ed.).
-
(2002)
ACS Symposium Series
, vol.2
, pp. 117
-
-
Walker, A.V.1
Fisher, G.L.2
Hooper, A.E.3
Tighe, T.4
Opila, R.5
Winograd, N.6
Allara, D.L.7
-
59
-
-
5244282299
-
-
E. Sacher, J. Pireaux, S.P. Kowalczyk (Eds.)
-
Pireaux J.J., Grégoire C., Vermeersch M., Thiry P.A., Vilar M.R., Caudano R. Metallization of Polymers 1990, 47. E. Sacher, J. Pireaux, S.P. Kowalczyk (Eds.).
-
(1990)
Metallization of Polymers
, pp. 47
-
-
Pireaux, J.J.1
Grégoire, C.2
Vermeersch, M.3
Thiry, P.A.4
Vilar, M.R.5
Caudano, R.6
-
64
-
-
84955044973
-
-
Atanasoska L., Anderson S.G., Meyer H.M., Lin Z., Weaver J.H. J. Vac. Sci. Technol. 1987, A5:3325.
-
(1987)
J. Vac. Sci. Technol.
, vol.A5
, pp. 3325
-
-
Atanasoska, L.1
Anderson, S.G.2
Meyer, H.M.3
Lin, Z.4
Weaver, J.H.5
-
65
-
-
53249123339
-
-
Ho P.S., Hahn P.O., Bartha J.W., Rubloff G.W., LeGoues F.K., Silverman B.D. J. Vac. Sci. Technol. 1985, A3:739.
-
(1985)
J. Vac. Sci. Technol.
, vol.A3
, pp. 739
-
-
Ho, P.S.1
Hahn, P.O.2
Bartha, J.W.3
Rubloff, G.W.4
LeGoues, F.K.5
Silverman, B.D.6
-
66
-
-
36549096069
-
-
Pireaux J.J., Vermeersch M., Grégoire C., Thiry P.A., Caudano R., Clarke T.C. J. Chem. Phys. 1988, 88:3353.
-
(1988)
J. Chem. Phys.
, vol.88
, pp. 3353
-
-
Pireaux, J.J.1
Vermeersch, M.2
Grégoire, C.3
Thiry, P.A.4
Caudano, R.5
Clarke, T.C.6
-
67
-
-
0037355361
-
-
Ding S.-J., Zaporojtchenko V., Kruse J., Zekonyte J., Faupel F. Appl. Phys. 2003, A76:851.
-
(2003)
Appl. Phys.
, vol.A76
, pp. 851
-
-
Ding, S.-J.1
Zaporojtchenko, V.2
Kruse, J.3
Zekonyte, J.4
Faupel, F.5
-
69
-
-
0022317656
-
-
Hahn P.O., Rubloff G.W., Bartha J.W., LeGoues E.K., Ho P.S. Mater. Res. Soc. Symp. Proc. 1985, 40:251.
-
(1985)
Mater. Res. Soc. Symp. Proc.
, vol.40
, pp. 251
-
-
Hahn, P.O.1
Rubloff, G.W.2
Bartha, J.W.3
LeGoues, E.K.4
Ho, P.S.5
-
73
-
-
0009397816
-
-
Fontaine M., Layet J.M., Grégoire C., Pireaux J.J. Appl. Phys. Lett. 1993, 62:2938.
-
(1993)
Appl. Phys. Lett.
, vol.62
, pp. 2938
-
-
Fontaine, M.1
Layet, J.M.2
Grégoire, C.3
Pireaux, J.J.4
-
77
-
-
84955014876
-
-
Faupel F., Huppe P.W., Ratzke K., Willecke R., Hehenkamp T.J. Vac. Sci. Technol. 1992, A10:92.
-
(1992)
J. Vac. Sci. Technol.
, vol.A10
, pp. 92
-
-
Faupel, F.1
Huppe, P.W.2
Ratzke, K.3
Willecke, R.4
Hehenkamp, T.5
-
78
-
-
36549103161
-
-
Faupel F., Gupta D., Silverman B.D., Ho P.S. Appl. Phys. Lett. 1989, 55:357.
-
(1989)
Appl. Phys. Lett.
, vol.55
, pp. 357
-
-
Faupel, F.1
Gupta, D.2
Silverman, B.D.3
Ho, P.S.4
-
79
-
-
0037624969
-
Diffusion in Amorphous Materials
-
H. Jain, D. Gupta (Eds.)
-
Gupta D., Faupel F., Willecke R. Diffusion in Amorphous Materials. The Minerals, Metals and Materials Society 1994, 189. H. Jain, D. Gupta (Eds.).
-
(1994)
The Minerals, Metals and Materials Society
, pp. 189
-
-
Gupta, D.1
Faupel, F.2
Willecke, R.3
-
85
-
-
19044363895
-
-
Springer-Verlag, Berlin, Heidelberg, NY, W. Martienssen, D.L. Beke (Eds.)
-
Faupel F., Kroll G. Landolt-Bornstein, Numerical Data and Functional Relationships in Science and Technology, New Series 1999, 111/33B I. Springer-Verlag, Berlin, Heidelberg, NY. W. Martienssen, D.L. Beke (Eds.).
-
(1999)
Landolt-Bornstein, Numerical Data and Functional Relationships in Science and Technology, New Series
-
-
Faupel, F.1
Kroll, G.2
-
86
-
-
6744225117
-
Thin Films, Encyclopedia Appl. Phys.
-
VCH Pub. Inc., NY
-
Gupta D. Thin Films, Encyclopedia Appl. Phys. Diffusion 1993, 5:75. VCH Pub. Inc., NY.
-
(1993)
Diffusion
, vol.5
, pp. 75
-
-
Gupta, D.1
-
87
-
-
84882855819
-
-
University of Göttingen
-
Willecke R. Ph.D. thesis 1993, University of Göttingen.
-
(1993)
Ph.D. thesis
-
-
Willecke, R.1
-
89
-
-
85133791923
-
-
Tröger L., Hunnefeld H., Nunes S., Oehring M., Fritsch D.J. Phys. Chem. 1997, 13101:1279.
-
(1997)
J. Phys. Chem.
, pp. 1279
-
-
Tröger, L.1
Hunnefeld, H.2
Nunes, S.3
Oehring, M.4
Fritsch, D.5
-
90
-
-
85015800823
-
-
IEEE, NY
-
Dabral S., Yang G., Bakhru H., Lu T.-M., McDonald J.E. Proceedings of the VMIC 1991, 408. IEEE, NY.
-
(1991)
Proceedings of the VMIC
, pp. 408
-
-
Dabral, S.1
Yang, G.2
Bakhru, H.3
Lu, T.-M.4
McDonald, J.E.5
-
92
-
-
84882846529
-
-
Kim N.Y., Yoon H.-S., Kim S.Y., Whang C.N., Kim K.W., Cho S.J. J. Vac. Sci. Technol. 1999, 1317:380.
-
(1999)
J. Vac. Sci. Technol.
, vol.1317
, pp. 380
-
-
Kim, N.Y.1
Yoon, H.-S.2
Kim, S.Y.3
Whang, C.N.4
Kim, K.W.5
Cho, S.J.6
-
93
-
-
0033070827
-
-
Du M., Opila R.L., Donnelly V.M., Sapjeta J., Boone T.J. Appl. Phys. 1999, 85:1496.
-
(1999)
J. Appl. Phys.
, vol.85
, pp. 1496
-
-
Du, M.1
Opila, R.L.2
Donnelly, V.M.3
Sapjeta, J.4
Boone, T.5
-
95
-
-
0031646465
-
-
Popovici D., Piyakis K., Meunier M., Sacher E.J. Appl. Phys. 1998, 83:108.
-
(1998)
J. Appl. Phys.
, vol.83
, pp. 108
-
-
Popovici, D.1
Piyakis, K.2
Meunier, M.3
Sacher, E.4
-
98
-
-
0032293227
-
Low-Dielectric Constant Materials and Applications in Microelectronics IV
-
C. Chiang, P.S. Ho, T.-M. Lu, J. Wetzel (Eds.)
-
Wong S.S., Loke A.L.S., Wetzel J.T., Townsend P.H., Vrtis R.N., Zussman M.P. Low-Dielectric Constant Materials and Applications in Microelectronics IV. Mater. Res. Soc. Symp. Proc. 1998, 511:317. C. Chiang, P.S. Ho, T.-M. Lu, J. Wetzel (Eds.).
-
(1998)
Mater. Res. Soc. Symp. Proc.
, vol.511
, pp. 317
-
-
Wong, S.S.1
Loke, A.L.S.2
Wetzel, J.T.3
Townsend, P.H.4
Vrtis, R.N.5
Zussman, M.P.6
-
99
-
-
85133734945
-
-
Honolulu
-
Loke A.L.S., Wetzel J.T., Ryu C., Lee W.-J., Wong S.S. Symposium on VLSI Technology 1998, Honolulu.
-
(1998)
Symposium on VLSI Technology
-
-
Loke, A.L.S.1
Wetzel, J.T.2
Ryu, C.3
Lee, W.-J.4
Wong, S.S.5
-
100
-
-
0038310983
-
-
B9.60
-
Mallikarjunan A., Juneja J., Yang G., Murarka S.P., Lu T.-M. Mater. Res. Soc. Symp. Proc. 2003, 734. B9.60.
-
(2003)
Mater. Res. Soc. Symp. Proc.
, vol.734
-
-
Mallikarjunan, A.1
Juneja, J.2
Yang, G.3
Murarka, S.P.4
Lu, T.-M.5
-
102
-
-
0036747426
-
-
Rogojevic S., Jain A., Gill W., Plawsky J.L. J. Electrochem. Soc. 2002, 149:F122.
-
(2002)
J. Electrochem. Soc.
, vol.149
, pp. F122
-
-
Rogojevic, S.1
Jain, A.2
Gill, W.3
Plawsky, J.L.4
-
103
-
-
0037095582
-
-
Fukuda T., Nishino H., Matsuura A., Matsunaga H. Jpn. J. Appl. Phys. 2002, 41:L537.
-
(2002)
Jpn. J. Appl. Phys.
, vol.41
, pp. L537
-
-
Fukuda, T.1
Nishino, H.2
Matsuura, A.3
Matsunaga, H.4
-
105
-
-
0345709492
-
-
Verlag ddp goldenbogen, Dresden, B. Michel, T. Winkler, M. Werner, H. Fecht (Eds.)
-
Behnke K., Strunskus T., Zaporojtchenko V., Faupel F. Proc. 3rd Int. Conf. MicroMat 2000 2000, 1052. Verlag ddp goldenbogen, Dresden. B. Michel, T. Winkler, M. Werner, H. Fecht (Eds.).
-
(2000)
Proc. 3rd Int. Conf. MicroMat 2000
, pp. 1052
-
-
Behnke, K.1
Strunskus, T.2
Zaporojtchenko, V.3
Faupel, F.4
-
106
-
-
84882895206
-
-
Biswas A., Marton Z., Kanzow J., Kruze J., Zaporojtchenko V., Faupel F., Strunskus T. Nanoletters 2003, 3(1):59.
-
(2003)
Nanoletters
, vol.3
, Issue.1
, pp. 59
-
-
Biswas, A.1
Marton, Z.2
Kanzow, J.3
Kruze, J.4
Zaporojtchenko, V.5
Faupel, F.6
Strunskus, T.7
|