Angle-resolved x-ray photoelectron spectroscopy comparison of copper/Teflon AF1600 and aluminum/Kapton metal diffusion

Journal of Applied Physics

Volumn 83, Issue 1, 1998, Pages 108-111

  Popovici, D ^a   Piyakis, K ^a   Meunier, M ^a   Sacher, E ^a  

^a ÉCOLE POLYTECHNIQUE DE MONTRÉAL   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ANNEALING; COPPER; DIFFUSION; FLUORINE CONTAINING POLYMERS; INTERFACES (MATERIALS); LAPLACE TRANSFORMS; MICROELECTRONICS; POLYAMIDES; POLYTETRAFLUOROETHYLENES; SURFACE ROUGHNESS;

FICKIAN DIFFUSION; KAPTON METAL DIFFUSION;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0031646465     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.366706     Document Type: Review

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