Chemical vapor deposition of Ni-C films from bis-(ethylcyclopentadienyl) nickel

Journal of Nanoscience and Nanotechnology

Volumn 11, Issue 9, 2011, Pages 8259-8263

  Alexandrov, S E ^a   Protopopova, V S ^a  

^a PETER THE GREAT ST PETERSBURG POLYTECHNIC UNIVERSITY   (Russian Federation)

Author keywords

Bis (ethylcyclopentadienyl) nickel; CVD; Nickel films

Indexed keywords

ATOMIC FORCE MICROSCOPES; CONVERSION RATES; DEPOSITED FILMS; EFFECT OF HYDROGEN; GASEOUS REACTION PRODUCTS; GASPHASE; NANO-COMPOSITE LAYERS; NICKEL FILMS; NICKEL SILICIDE; NICKEL THIN FILM; REACTION SYSTEM; X-RAY FLUORESCENCE SPECTROSCOPY;

ATOMIC FORCE MICROSCOPY; CARBON FILMS; CHEMICAL VAPOR DEPOSITION; DEPOSITION; FLUORESCENCE SPECTROSCOPY; HYDROGEN; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NANOCOMPOSITE FILMS; NANOMAGNETICS; NICKEL; SCANNING ELECTRON MICROSCOPY; SILICIDES; THIN FILMS; VAPOR DEPOSITION;

NICKEL COATINGS;

EID: 84856932965     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2011.5058     Document Type: Conference Paper

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