Mechanism of Ni film CVD with a Ni(ktfaa)2 precursor on a silicon substrate

Chemical Vapor Deposition

Volumn 11, Issue 8-9, 2005, Pages 368-374

  Bakovets, Vladimir V ^a   Mithin, Valentin N ^a   Gelfond, Nikolay V ^a  

^a NIKOLAEV INSTITUTE OF INORGANIC CHEMISTRY   (Russian Federation)

Author keywords

Nickel films; Silicon substrate

Indexed keywords

DECOMPOSITION; HELIUM; HYDROGEN; METALLIC FILMS; NICKEL; PYROLYSIS; SILICON; SUBSTRATES;

CHELATE DECOMPOSITION; NICKEL FILMS; SILICON SUBSTRATES;

CHEMICAL VAPOR DEPOSITION;

EID: 27944482990     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/cvde.200506376     Document Type: Article

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