Analyzing the development of N-doped TiO2 thin films deposited by RF magnetron sputtering

Sensor Letters

Volumn 11, Issue 4, 2013, Pages 675-678

  Dobromir, Marius ^a   Manole, Alina Vasilica ^a   Nica, Valentin ^a   Apetrei, Radu ^a   Neagu, Maria ^a   Luca, Dumitru ^a  

^a ALEXANDRU IOAN CUZA UNIVERSITY OF IASI   (Romania)

Author keywords

Annealing; N doped TiO2; Sputtering; VBXPS

Indexed keywords

CRYSTALLINE STRUCTURE; DEPOSITED MATERIALS; N-DOPED TIO; RF-MAGNETRON SPUTTERING; SURFACE ELEMENTAL COMPOSITIONS; UV-VIS SPECTROPHOTOMETRY; VALENCE BAND PHOTOELECTRON SPECTROSCOPY; VBXPS;

ANNEALING; ELECTRONIC STRUCTURE; MAGNETRON SPUTTERING; NITROGEN; OXIDE MINERALS; SEMICONDUCTOR DOPING; SPUTTERING; THIN FILMS; X RAY DIFFRACTION;

TITANIUM DIOXIDE;

EID: 84881293548     PISSN: 1546198X     EISSN: 15461971     Source Type: Journal    
DOI: 10.1166/sl.2013.2936     Document Type: Article

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