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Volumn 543, Issue , 2013, Pages 277-280

Characterization of rutile N-doped TiO2 films prepared by RF magnetron sputtering

Author keywords

RF magnetron sputtering; Rutile

Indexed keywords

CRYSTALLINE MATERIALS; DOPING (ADDITIVES); ENERGY GAP; MAGNETRON SPUTTERING; OXIDE MINERALS; TITANIUM DIOXIDE; TRANSDUCERS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 84876374937     PISSN: 10139826     EISSN: 16629795     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/KEM.543.277     Document Type: Conference Paper
Times cited : (1)

References (13)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.