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Volumn 543, Issue , 2013, Pages 277-280
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Characterization of rutile N-doped TiO2 films prepared by RF magnetron sputtering
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Author keywords
RF magnetron sputtering; Rutile
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Indexed keywords
CRYSTALLINE MATERIALS;
DOPING (ADDITIVES);
ENERGY GAP;
MAGNETRON SPUTTERING;
OXIDE MINERALS;
TITANIUM DIOXIDE;
TRANSDUCERS;
X RAY PHOTOELECTRON SPECTROSCOPY;
AS-DEPOSITED FILMS;
CRYSTALLINE STRUCTURE;
CRYSTALLINE SUBSTRATES;
DEPOSITED MATERIALS;
RF-MAGNETRON SPUTTERING;
RUTILE;
SURFACE ELEMENTAL ANALYSIS;
X-RAY DIFFRACTION DATA;
THIN FILMS;
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EID: 84876374937
PISSN: 10139826
EISSN: 16629795
Source Type: Book Series
DOI: 10.4028/www.scientific.net/KEM.543.277 Document Type: Conference Paper |
Times cited : (1)
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References (13)
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