A Comparative Study on the Photocatalytic and Gas Sensing Properties of Pure and N-doped TiO2 thin Films

Plasma Processes and Polymers

Volumn 6, Issue SUPPL. 1, 2009, Pages

  Delan, Annekatrin ^a   Karuppasamy, Alagarsamy ^a   Schultheiß, Eberhard ^a,b  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^b Fraunhofer Institute for Electron Beam and Plasma Technology   (Germany)

Author keywords

Gas sensors; Magnetron sputtering; Oxides; Sensors; Thin films; UV irradiation

Indexed keywords

COMPARATIVE STUDIES; GAS SENSING BEHAVIOR; GAS SENSING PROPERTIES; GAS SENSITIVITY; GAS SENSORS; LOW TEMPERATURES; N-DOPED TIO; NITROGEN-DOPED; PHOTO-CATALYTIC; PHOTOCATALYTIC ACTIVITIES; PHOTOCATALYTIC EFFICIENCY; PULSED DC MAGNETRON SPUTTERING; UV IRRADIATION;

CHEMICAL DETECTION; GAS DETECTORS; GAS SENSING ELECTRODES; IRRADIATION; MAGNETRON SPUTTERING; OXYGEN; SENSORS; THIN FILMS; VAPOR DEPOSITION;

GASES;

EID: 77954895213     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200931805     Document Type: Conference Paper

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