SCOPUS 정보 검색 플랫폼

Sensor Letters

Volumn 6, Issue 6, 2008, Pages 1049-1053

Sensing behavior of TiO2 thin film prepared by r.f. reactive sputtering

(2) Lee, H Y a Akbar, S A a

a OHIO STATE UNIVERSITY (United States)

Author keywords

Reactive sputtering; Sensing mechanism; TiO2 thin film sensor

Indexed keywords

ELECTRODEPOSITION; GAS SENSING ELECTRODES; GOLD; OXIDE MINERALS; REACTIVE SPUTTERING; SENSORS; THIN FILM DEVICES; THIN FILMS; TITANIUM DIOXIDE; TITANIUM OXIDES;

ALUMINA SUBSTRATES; AS-DEPOSITED THIN FILMS; AU ELECTRODES; CO CONCENTRATIONS; DEBYE LENGTHS; GAS-SENSING; MAXIMUM SENSITIVITIES; R.F. REACTIVE SPUTTERING; SEM OBSERVATIONS; SENSING MECHANISM; SIMPLE MODELS; TIO2 THIN FILM SENSOR;

AMORPHOUS FILMS;

EID: 63049089494 PISSN: 1546198X EISSN: None Source Type: Journal
DOI: 10.1166/sl.2008.560 Document Type: Conference Paper

Times cited : (4)

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