Deposition of thin copper layers using copper(II) carboxylate complexes with tert-butylamine as new CVD precursors

Chemical Vapor Deposition

Volumn 19, Issue 7-9, 2013, Pages 251-259

  Piszczek, Piotr ^a   Szymańska, Iwona Barbara ^a   Talik, Ewa ^b   Heimann, Janusz ^b  

^a NICOLAUS COPERNICUS UNIVERSITY   (Poland)

^b UNIVERSITY OF SILESIA   (Poland)

Author keywords

Copper layers; Copper(II) amine carboxylate complexes; Morphology studies; Thermolysis pathway

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARBOXYLATION; CHEMICAL VAPOR DEPOSITION; COPPER; ELECTRON DIFFRACTION; ELECTRON MICROSCOPY; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICA; SILICON OXIDES; SUBSTRATES; TITANIUM DIOXIDE; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBOXYLATE COMPLEXES; COPPER CARBOXYLATE; COPPER COMPLEXES; COPPER LAYER; GENERAL FORMULAS; SELECTED AREA ELECTRON DIFFRACTION; STORAGE AND HANDLING; VARIABLE TEMPERATURE;

COPPER COMPOUNDS;

EID: 84881034990     PISSN: 09481907     EISSN: 15213862     Source Type: Journal    
DOI: 10.1002/cvde.201207049     Document Type: Article

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