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Volumn 441, Issue 1-3, 2013, Pages 133-137

Chemically sensitive amorphization process in the nanolaminated Cr 2AC (A = Al or Ge) system from TEM in situ irradiation

(5) Bugnet, Matthieu a Mauchamp, Vincent a Oliviero, Erwan b Jaouen, Michel a Cabioc'h, Thierry a

a UNIVERSITÉ DE POITIERS (France)

b CENTRE DE CALCUL DE L INSTITUT NATIONAL DE PHYSIQUE NUCLEAIRE ET DE PHYSIQUE DES PARTICULES (France)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ALUMINUM COMPOUNDS; AMORPHIZATION; CHROMIUM COMPOUNDS; GERMANIUM COMPOUNDS; ION BOMBARDMENT; TRANSMISSION ELECTRON MICROSCOPY;

AMORPHIZATION PROCESS; CHEMICAL COMPOSITIONS; DEFECT ACCUMULATION; DIRECT IMPACT; FLUENCES; SITU IRRADIATIONS;

VANADIUM COMPOUNDS;

EID: 84879299022 PISSN: 00223115 EISSN: None Source Type: Journal
DOI: 10.1016/j.jnucmat.2013.05.028 Document Type: Letter

Times cited : (27)

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