Formation of nanosized hills on Ti3SiC2 oxide layer irradiated with swift heavy ions

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 270, Issue 1, 2012, Pages 36-43

  Nappe J C ^a   Monnet, I ^b   Audubert, F ^c   Grosseau, Ph ^a   Beauvy, M ^c   Benabdesselam, M ^d  

^a ECOLE DES MINES DE SAINT ETIENNE   (France)

^b UNIVERSITÉ DE CAEN   (France)

^c IRFM   (France)

^d UNIVERSITÉ CÔTE D'AZUR   (France)

Author keywords

Atomic force microscopy; Cross sectional transmission electron microscopy; Heavy ion irradiation; Oxidation; Ti3SiC2; X ray photoelectron spectrometry

Indexed keywords

AFM; AMORPHOUS LAYER; AMORPHOUS OXIDE LAYERS; CROSS SECTIONAL TRANSMISSION ELECTRON MICROSCOPY; ELECTRONIC INTERACTIONS; ELECTRONIC STOPPING POWER; FUEL CLADDING; GAS-COOLED FAST REACTORS; IRRADIATION DOSE; NANO-SIZED; OXIDE LAYER; REFRACTORY COMPOUNDS; SAMPLE SURFACE; SURFACE CHANGES; SWIFT HEAVY ION IRRADIATION; SWIFT HEAVY IONS; TOPOGRAPHIC MODIFICATIONS; X-RAY PHOTOELECTRONS;

ATOMIC FORCE MICROSCOPY; FAST REACTORS; HEAVY IONS; IRRADIATION; OXIDATION; REFRACTORY METALS; SURFACE TREATMENT; TRANSMISSION ELECTRON MICROSCOPY; XENON;

SILICON CARBIDE;

EID: 80755168997     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2011.09.027     Document Type: Article

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