Low temperature plasma assisted atomic layer deposition in nitrogen carrier gas studied by optical emission spectroscopy

European Physical Journal D

Volumn 67, Issue 4, 2013, Pages

  Lehti, Sanna T ^a  

^a LAPPEENRANTA UNIVERSITY OF TECHNOLOGY   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; ATOMS; CARBON MONOXIDE; INDUSTRIAL EMISSIONS; LIGHT EMISSION; OPTICAL EMISSION SPECTROSCOPY; PULSED LASER DEPOSITION; TEMPERATURE; TITANIUM METALLOGRAPHY;

EMITTING SPECIES; LOW TEMPERATURE PLASMAS; NITROGEN MONOXIDE; PLASMA ASSISTED DEPOSITION; PLASMA EMISSION; PROCESS MEASUREMENTS; SECOND POSITIVE SYSTEMS; VIBRATIONAL TEMPERATURE;

NITROGEN PLASMA;

EID: 84879116991     PISSN: 14346060     EISSN: 14346079     Source Type: Journal    
DOI: 10.1140/epjd/e2013-30428-8     Document Type: Article

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