Optical and hall properties of Al-doped ZnO thin films fabricated by pulsed laser deposition with various substrate temperatures

Journal of Materials Science: Materials in Electronics

Volumn 24, Issue 6, 2013, Pages 1863-1868

  Kang, Seong Jun ^a   Joung, Yang Hee ^a  

^a Chonnam National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AL-DOPED ZINC OXIDE; AL-DOPED ZNO THIN FILMS; BURSTEIN-MOSS EFFECTS; C-AXIS ORIENTED; DIFFRACTION PEAKS; QUARTZ SUBSTRATE; SUBSTRATE TEMPERATURE; VARIOUS SUBSTRATES;

ALUMINUM; DIFFRACTION; ELECTRIC PROPERTIES; FABRICATION; PULSED LASER DEPOSITION; QUARTZ; THIN FILMS;

SUBSTRATES;

EID: 84878689447     PISSN: 09574522     EISSN: 1573482X     Source Type: Journal    
DOI: 10.1007/s10854-012-1024-y     Document Type: Article

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