Resist process windows in electron-beam lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7823, Issue PART 1, 2010, Pages

  Jamieson, Andrew T ^a   Wilcox, Nathan ^a   Kwok, Wai Y ^a   Kim, Yong Kwan ^a  

^a INTEL CORPORATION   (United States)

Author keywords

Electron beam lithography; Photomask; Proximity effects; Resist; Resolution

Indexed keywords

AERIAL IMAGES; ANALYSIS TECHNIQUES; BEAM CORRECTION; CORRECTION METHOD; DIE-TO-DIE INSPECTION; HIGH RESOLUTION; PATTERN DENSITY; PROXIMITY EFFECTS; RESIST; RESIST PROCESS; RESIST RESOLUTION; RESOLUTION; RESOLUTION PROCESS; SUB RESOLUTION ASSIST FEATURE;

DIES; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ELECTRON OPTICS; ELECTRONS; IMAGE QUALITY;

PHOTOMASKS;

EID: 78649870565     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.868037     Document Type: Conference Paper

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