The novel top-coat material for RLS trade-off reduction in EUVL

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8322, Issue , 2012, Pages

  Onishi, Ryuji ^a   Sakamoto, Rikimaru ^a   Fujitani, Noriaki ^a   Endo, Takafumi ^a   Ho, Bang Ching ^a  

^a NISSAN CHEMICAL INDUSTRIES LTD   (Japan)

Author keywords

EUV lithography; Out of band; Out of band protection layer (OBPL); Resist

Indexed keywords

ABSORBANCES; ABSORPTION PROPERTY; CRITICAL ISSUES; EUV LIGHT SOURCES; EXTREME ULTRAVIOLETS; HIGH TRANSMITTANCE; LOW POWER; NEXT GENERATION LITHOGRAPHY; OUT OF BAND; PROTECTION LAYERS; RESIST; TOP-COATS;

EXTREME ULTRAVIOLET LITHOGRAPHY; LIGHT SOURCES;

LITHOGRAPHY;

EID: 84861490477     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.916341     Document Type: Conference Paper

References (7)

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