Effect of the electrochemical technique on nanocrystalline ZnO electrodeposition, its structural, morphological and photoelectrochemical properties

Thin Solid Films

Volumn 537, Issue , 2013, Pages 119-123

  Chettah, Hamdane ^a   Abdi, Djamila ^a  

^a Faculté de Technologie   (Algeria)

Author keywords

Chronoamperometry; Cyclic voltammetry; Electrodeposition; Grain size; Photoanodic current; Wurtzite; X ray diffraction; Zinc oxide

Indexed keywords

CHRONOAMPEROMETRY TECHNIQUES; ELECTROCHEMICAL TECHNIQUES; FLUORINE DOPED TIN OXIDE; GRAIN SIZE; PHOTOANODIC CURRENT; PHOTOELECTROCHEMICAL PROPERTIES; SURFACE ROUGHNESS FACTORS; WURTZITES;

ATOMIC FORCE MICROSCOPY; CHLORINE COMPOUNDS; CHRONOAMPEROMETRY; CYCLIC VOLTAMMETRY; DEPOSITS; ELECTRIC CONDUCTIVITY; ELECTRODEPOSITION; GRAIN SIZE AND SHAPE; SUBSTRATES; SURFACE ROUGHNESS; TIN OXIDES; X RAY DIFFRACTION; ZINC SULFIDE;

ZINC OXIDE;

EID: 84878276507     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2013.04.024     Document Type: Article

References (26)

1. L. Stolt, J. Hedstrom, J. Kessler, M. Ruckh, K.O. Velthaus, and H.W. Schock Appl. Phys. Lett. 62 1993 597
2. W.C. Shih, and M.S. Wu J. Cryst. Growth 137 1994 319
3. K.S. Weißenrieder, and J. Muller Thin Solid Films 300 1997 30
4. D. Gal, G. Hodes, D. Lincot, and H.W. Schock Thin Solid Films 361 2000 79
5. Th. Pauporte, and D. Lincot Electrochim. Acta 45 2000 3345
6. B.P. Zhang, K. Wakatsuky, N.T. Binh, N. Usami, and Y. Segawa Thin Solid Films 449 2004 12
7. T.W. Kim, K.D. Kwack, H.-K. Kim, Y.S. Yoon, J.H. Bahang, and H.L. Park Solid State Commun. 127 2003 635
8. M.A. Martinez, J. Herrero, and M.T. Gutierrez Sol. Energy Mater. Sol. Cells 45 1997 75
9. X.W. Sun, and H.S. Kwok J. Appl. Phys. 86 1 1999 408
10. Y. Chen, D.M. Bagnall, H.-J. Koh, K.-T. Park, K. Hiraga, Z. Zhu, and T. Yao J. Appl. Phys. 84 1998 3912
11. M.T. Mohammad, A.A. Hashim, and M.H. Al-Maamory Mater. Chem. Phys. 99 2006 382
12. Z.F. Liu, Z.G. Jin, W. Li, and J.J. Qiu Mater. Lett. 59 2005 3620
13. D. Lincot Thin Solid Films 487 2005 40
14. M. Kemell, F. Dartigues, M. Ritala, and M. Leskela Thin Solid Films 434 2003 20
15. H.W. Liang, Y.M. Lu, D.Z. Shen, J.F. Yan, B.H. Li, J.Y. Zhang, Y.C. Liu, and X.W. Fan J. Cryst. Growth 278 2005 305
16. N.R. Aghamalyan, A. Gambaryan, E.K. Goulanian, R.K. Hovsepyan, R.B. Kostanyan, S.I. Petrosyan, E.S. Vardanyan, and A.F. Zerrouk Semicond. Sci. Technol. 18 2003 525
17. E. Azaceta, R. Marcilla, D. Mecerreye, M. Ungureanu, A. Dev, T. Voss, S. Fantini, H.-J. Grande, G. Cabañero, and R. Tena-Zaera Phys. Chem. Chem. Phys. 13 29 2011 13433
18. D. Gal, G. Hodes, D. Lincot, and H.W. Schock Thin Solid Films 361-362 2000 79
19. J. Elias, Tina-Zaera, and R. Levy-Clement Thin Solid Films 515 2007 8553
20. Z. Guanglong, C. Wexiang, L. Run, and X. Zudhe Mater. Lett. 61 2007 4305
21. R. Chander, and A.K. Raychaudhuri Solid State Commun. 145 2008 81
22. M. Izaki, and T. Omi Appl. Phys. Lett. 68 1996 2439
23. A. Goux, T. Pauporte, J. Chivot, and D. Lincot Electrochim. Acta 50 2005 2239
24. T. Yoshida, D. Komatsu, N. Shimokawa, and H. Minoura Thin Solid Films 451-452 2004 166
25. M.R. Khajavi, D.J. Blacwood, G. Cabanero, and R. Tena-Zaera Electrochim. Acta 69 2012 181
26. H. Chettah, D. Abdi, H. Amardjia, and H. Haffar Ionics 15 2 2009 169