Reduction of graphene oxide at the interface between a Ni layer and a SiO2 substrate

Carbon

Volumn 59, Issue , 2013, Pages 472-478

  Tanaka, Hiroshige ^a   Obata, Seiji ^a   Saiki, Koichiro ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

FLAMMABLE GAS; GRAPHENE OXIDES; HIGH VACUUM; PRECIPITATION PROCESS;

GRAPHENE; METHANE; PRECIPITATION (CHEMICAL); RAMAN SPECTROSCOPY;

NICKEL;

EID: 84877710667     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2013.03.041     Document Type: Article

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