Structural and electrical properties of (Bi0.9Dy 0.1)(Fe0.975TM0.025)O 3±δ (TM=Ni2+, Cr3+ and Ti 4+) thin films

Ceramics International

Volumn 39, Issue 6, 2013, Pages 6057-6062

  Raghavan, C M ^a   Kim, E S ^a   Kim, J W ^a   Kim, S S ^a  

^a Changwon National University   (South Korea)

Author keywords

A. Films; C. Electrical properties; C. Ferroelectric properties; D. Perovskites

Indexed keywords

CHEMICAL SOLUTION DEPOSITION METHOD; COERCIVE ELECTRIC FIELD; ENHANCED PROPERTIES; FERROELECTRIC PROPERTY; LOW-LEAKAGE CURRENT; REMNANT POLARIZATIONS; SATURATED HYSTERESIS LOOPS; STRUCTURAL AND ELECTRICAL PROPERTIES;

DYSPROSIUM; DYSPROSIUM COMPOUNDS; ELECTRIC FIELDS; FERROELECTRIC FILMS; FERROELECTRICITY; METAL IONS; MICROSTRUCTURE; NICKEL; THIN FILMS;

ELECTRIC PROPERTIES;

EID: 84877705149     PISSN: 02728842     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ceramint.2013.01.022     Document Type: Article

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