SCOPUS 정보 검색 플랫폼

Journal of Low Temperature Physics

Volumn 170, Issue 5-6, 2013, Pages 436-441

A novel defect inspection method for semiconductor wafer based on magneto-optic imaging

(5) Pan, Z a Chen, L a Li, W a Zhang, G b Wu, P c

a SOUTH CHINA NORMAL UNIVERSITY (China)

b SUN YAT SEN UNIVERSITY (China)

c NANJING UNIVERSITY (China)

Author keywords

Defect inspection; Image enhancement; Magneto optic imaging; Wafer

Indexed keywords

DEFECT INSPECTION; EDDY CURRENT DISTRIBUTION; FARADAY ROTATION EFFECT; MAGNETO-OPTIC IMAGING; MANUFACTURING PROCESS; SEMI-CONDUCTOR WAFER; WAFER; WATER-SHED ALGORITHM;

EDDY CURRENT TESTING; IMAGE ENHANCEMENT; IMAGE SEGMENTATION; INSPECTION; MAGNETIC FLUX;

DEFECTS;

EID: 84876284448 PISSN: 00222291 EISSN: 15737357 Source Type: Journal
DOI: 10.1007/s10909-012-0671-y Document Type: Conference Paper

Times cited : (7)

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