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1
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84871832916
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Challenges and opportunities for HfOX based resistive random access memory
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Y.S. Chen, H.Y. Lee, P.S. Chen, C.H. Tsai, P.Y. Gu, T.Y. Wu, K.H. Tsai, S.S. Sheu, W.P. Lin, C.H. Lin, P.F. Chiu, W.S. Chen, F.T. Chen, C. Lien, and M.-J. Tsai, "Challenges and Opportunities for HfOX Based Resistive Random Access Memory", IEDM Tech. Dig., 2011, pp717-720.
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IEDM Tech. Dig
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Chen, Y.S.1
Lee, H.Y.2
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Tsai, C.H.4
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Wu, T.Y.6
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Sheu, S.S.8
Lin, W.P.9
Lin, C.H.10
Chiu, P.F.11
Chen, W.S.12
Chen, F.T.13
Lien, C.14
Tsai, M.-J.15
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2
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84859214431
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10x10nm2 Hf/HfOx crossbar resistive ram with excellent performance, reliability and low-energy operation
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B. Govoreanu, G.S. Kar, Y-Y. Chen, V. Paraschiv, S. Kubicek, A. Fantini, I.P. Radu, L. Goux, S. Clima, R. Degraeve, N. Jossart, O. Richard, T. Vandeweyer, K. Seo, P. Hendrickx, G. Pourtois, H. Bender, L. Altimime, D.J. Wouters, J.A. Kittl, M. Jurczak "10x10nm2 Hf/HfOx Crossbar Resistive RAM with Excellent Performance, Reliability and Low-Energy Operation", IEDM Tech. Dig., 2011, pp729-732.
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IEDM Tech. Dig
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Govoreanu, B.1
Kar, G.S.2
Chen, Y.-Y.3
Paraschiv, V.4
Kubicek, S.5
Fantini, A.6
Radu, I.P.7
Goux, L.8
Clima, S.9
Degraeve, R.10
Jossart, N.11
Richard, O.12
Vandeweyer, T.13
Seo, K.14
Hendrickx, P.15
Pourtois, G.16
Bender, H.17
Altimime, L.18
Wouters, D.J.19
Kittl, J.A.20
Jurczak, M.21
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3
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84866564550
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Multi-layer sidewall WOX resistive memory suitable for 3D ReRAM
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W.C. Chien, F.M. Lee, Y.Y. Lin, M.H. Lee, S.H. Chen, C.C. Hsieh, E.K. Lai, H.H. Hui, Y.K. Huang, C.C. Yu, C.F. Chen, H.L. Lung, K.Y. Hsieh, and Chih-Yuan Lu "Multi-Layer Sidewall WOX Resistive Memory Suitable for 3D ReRAM", Symp. on VLSI Tech. Dig., pp.153-154, 2012.
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Symp. on VLSI Tech. Dig
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Chien, W.C.1
Lee, F.M.2
Lin, Y.Y.3
Lee, M.H.4
Chen, S.H.5
Hsieh, C.C.6
Lai, E.K.7
Hui, H.H.8
Huang, Y.K.9
Yu, C.C.10
Chen, C.F.11
Lung, H.L.12
Hsieh, K.Y.13
Lu, C.14
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4
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84866546933
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Multi-level switching of triple-layered TaOx RRAM with excellent reliability for storage class memory
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S.R. Lee, Y.-B. Kim, M. Chang, K.M. Kim, C.B. Lee, J.H. Hur, G.-S. Park, D. Lee, M.-J. Lee, C.J. Kim, U-I. Chung, I.-K. Yoo and K. Kim, "Multi-level Switching of Triple-layered TaOx RRAM with Excellent Reliability for Storage Class Memory", Symp. on VLSI Tech. Dig., pp.71-72, 2012.
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Symp. on VLSI Tech. Dig
, pp. 71-72
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Lee, S.R.1
Kim, Y.-B.2
Chang, M.3
Kim, K.M.4
Lee, C.B.5
Hur, J.H.6
Park, G.-S.7
Lee, D.8
Lee, M.-J.9
Kim, C.J.10
Chung, U.-I.11
Yoo, I.-K.12
Kim, K.13
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5
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84864232842
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Oxide-based RRAM: Unified microscopic principle for both unipolar and bipolar switching
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B. Gao, J. F. Kang, Y. S. Chen, F. F. Zhang, B. Chen, P. Huang, L. F. Liu, X. Y. Liu, Y. Y. Wang, X. A. Tran, Z. R. Wang, H. Y. Yu, and Albert Chin, "Oxide-Based RRAM: Unified Microscopic Principle for both Unipolar and Bipolar Switching", IEDM. Tech.Dig., 2011, pp.417-420.
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Gao, B.1
Kang, J.F.2
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Zhang, F.F.4
Chen, B.5
Huang, P.6
Liu, L.F.7
Liu, X.Y.8
Wang, Y.Y.9
Tran, X.A.10
Wang, Z.R.11
Yu, H.Y.12
Chin, A.13
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6
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84856999285
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On the stochastic nature of resistive switching in metal oxide RRAM: Physical modeling, monte carlo simulation, and experimental characterization
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S. Yu, X. M. Guan, and H.-S. P. Wong, "On the Stochastic Nature of Resistive Switching in Metal Oxide RRAM: Physical Modeling, Monte Carlo Simulation, and Experimental Characterization", IEDM. Tech.Dig., 2011, pp.413-416.
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IEDM. Tech.Dig
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Yu, S.1
Guan, X.M.2
Wong, H.-S.P.3
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7
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84866561026
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Dynamic 'hour glass' model for SET and RESET in HfO2 RRAM
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R. Degraeve, A. Fantini, S. Clima, B. Govoreanu, L. Goux, Y.Y. Chen, D.J. Wouters, Ph. Roussel, G.S. Kar, G. Pourtoi, S. Cosemans, J.A. Kittl, G. Groeseneken, M. Jurczak, L. Altimime, "Dynamic 'Hour Glass' Model for SET and RESET in HfO2 RRAM", Symp. on VLSI Tech. Dig., pp.75-76, 2012.
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Degraeve, R.1
Fantini, A.2
Clima, S.3
Govoreanu, B.4
Goux, L.5
Chen, Y.Y.6
Wouters, D.J.7
Roussel, Ph.8
Kar, G.S.9
Pourtoi, G.10
Cosemans, S.11
Kittl, J.A.12
Groeseneken, G.13
Jurczak, M.14
Altimime, L.15
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8
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85088043866
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Stochastic simulation of forming, SET and RESET process for transition metal oxide-based resistive switching memory
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P. Huang, B. Gao, B. Chen, F.F. Zhang, L.F. Liu, G. Du, J.F. Kang, X.Y. Liu, "Stochastic Simulation of Forming, SET and RESET Process for Transition Metal Oxide-based Resistive Switching Memory", SISPAD. 2012, pp.312-315.
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Huang, P.1
Gao, B.2
Chen, B.3
Zhang, F.F.4
Liu, L.F.5
Du, G.6
Kang, J.F.7
Liu, X.Y.8
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9
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79953059793
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HfOX/TiOX/HfOX/TiOX multilayer-based forming-free RRAM devices with excellent uniformity
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Apr
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Z. Fang, H. Y. Yu, X. Li, N. Singh, G. Q. Lo, and D. L. Kwong, "HfOX/TiOX/HfOX/TiOX Multilayer-Based Forming-Free RRAM Devices With Excellent Uniformity", IEEE Electron Device Lett., vol. 32, pp. 566-568, Apr. 2011.
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Fang, Z.1
Yu, H.Y.2
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Lo, G.Q.5
Kwong, D.L.6
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