Determination of energy band alignment in ultrathin Hf-based oxide/Pt system

Journal of Physics: Conference Series

Volumn 417, Issue 1, 2013, Pages

  Ohta, A ^a   Murakami, H ^a   Higashi, S ^a   Miyazaki, S ^b  

^a HIROSHIMA UNIVERSITY   (Japan)

^b NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BAND STRUCTURE; DEPOSITION; DYSPROSIUM; ELECTRONIC STRUCTURE; ENERGY DISSIPATION; ENERGY GAP; GADOLINIUM; HAFNIUM; HAFNIUM OXIDES; METALLORGANIC CHEMICAL VAPOR DEPOSITION; ORGANIC CHEMICALS; ORGANOMETALLICS; PHOTOELECTRON SPECTROSCOPY; PHOTOELECTRONS; PHOTONS; PLATINUM; PLATINUM METALS; THIN FILMS; TITANIUM; TITANIUM OXIDES; VALENCE BANDS; VAPOR DEPOSITION; WORK FUNCTION; X RAY PHOTOELECTRON SPECTROSCOPY;

A3. METAL ORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD); ENERGY BAND PROFILES; ENERGY BANDGAPS; ENERGY-BAND ALIGNMENT; ENERGY-LOSS SPECTRUM; HIGH RESOLUTION; POST DEPOSITION ANNEALING; VALENCE BAND OFFSETS;

OXIDE FILMS;

EID: 84875902064     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/417/1/012012     Document Type: Conference Paper

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