A single-mask process for 3-D microstructure fabrication in PDMS

Journal of Microelectromechanical Systems

Volumn 22, Issue 2, 2013, Pages 356-362

  Hosseini, Yahya ^a   Zellner, Phillip ^a   Agah, Masoud ^a  

^a State University   (United States)

Author keywords

3 D; Dielectrophoresis (DEP); microfluidics; polydimethylsiloxane (PDMS)

Indexed keywords

3-D; APPLIED POTENTIALS; INSULATOR-BASED DIELECTROPHORESIS; MICROSTRUCTURE FABRICATION; POLYDIMETHYLSILOXANE PDMS; SILICON SUBSTRATES; SINGLE-MASK PROCESS; TRAPPING EFFICIENCIES;

ASPECT RATIO; ELECTROPHORESIS; GLASS; MICROCHANNELS; MICROFLUIDICS; POLYSTYRENES; REACTIVE ION ETCHING; SILICON;

SILICONES;

EID: 84875804025     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2012.2231402     Document Type: Article

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