High-throughput three-dimensional lithographic microfabrication

Optics Letters

Volumn 35, Issue 10, 2010, Pages 1602-1604

  Kim, Daekeun ^a   So, Peter T C ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

3D MICROSTRUCTURES; ARBITRARY PATTERNS; AXIAL RESOLUTIONS; DEPTH-RESOLVED; FEMTOSECOND LIGHT PULSE; HIGH THROUGHPUT; INDUSTRIAL SCALE; LITHOGRAPHIC MICROFABRICATION; MICRO DEVICES; PROOF OF CONCEPT; SU-8 PHOTORESIST; THEORETICAL PREDICTION; TISSUE ENGINEERING SCAFFOLD; WIDE-FIELD;

MICROANALYSIS; MICROFABRICATION; MICROMACHINING; PHOTOBLEACHING; PHOTONIC CRYSTALS; PHOTORESISTS; TISSUE ENGINEERING;

THREE DIMENSIONAL;

MICROSPHERE;

ARTICLE; BLEACHING; METHODOLOGY; MICROTECHNOLOGY; SCANNING ELECTRON MICROSCOPY;

MICROSCOPY, ELECTRON, SCANNING; MICROSPHERES; MICROTECHNOLOGY; PHOTOBLEACHING;

EID: 77954949378     PISSN: 01469592     EISSN: 15394794     Source Type: Journal    
DOI: 10.1364/OL.35.001602     Document Type: Article

References (23)

1. A. Hatzor and P. S. Weiss, Science 291, 1019 (2001).
2. S. Kawata, H. B. Sun, T. Tanaka, and K. Takada, Nature 412, 697 (2001).
3. R. D. Piner, J. Zhu, F. Xu, S. H. Hong, and C. A. Mirkin, Science 283, 661 (1999).
4. A. A. Tseng, Small 1, 924 (2005).
5. B. H. Cumpston, S. P. Ananthavel, S. Barlow, D. L. Dyer, J. E. Ehrlich, L. L. Erskine, A. A. Heikal, S. M. Kuebler, I. Y. S. Lee, D. McCord-Maughon, J. Q. Qin, H. Rockel, M. Rumi, X. L. Wu, S. R. Marder, and J. W. Perry, Nature 398, 51 (1999).
6. H. B. Sun, Y. Xu, S. Juodkazis, K. Sun, M. Watanabe, S. Matsuo, H. Misawa, and J. Nishii, Opt. Lett. 26, 325 (2001).
7. M. Stoneman, M. Fox, C. Y. Zeng, and V. Raicu, Lab Chip 9, 819 (2009).
8. B. Kaehr and J. B. Shear, Proc. Natl. Acad. Sci. USA 105, 8850 (2008).
9. L. P. Cunningham, M. P. Veilleux, and P. J. Campagnola, Opt. Express 14, 8613 (2006).
10. B. Kaehr and J. B. Shear, J. Am. Chem. Soc. 129, 1904 (2007).
11. J. Kato, N. Takeyasu, Y Adachi, H. B. Sun, and S. Kawata, Appl. Phys. Lett. 86, 044102 (2005).
12. S. Jeon, V. Malyarchuk, J. A. Rogers, and G. P. Wiederrecht, Opt. Express 14, 2300 (2006).
13. S. Shoji and S. Kawata, Appl. Phys. Lett. 76, 2668 (2000).
14. C. N. LaFratta, L. J. Li, and J. T. Fourkas, Proc. Natl. Acad. Sci. USA 103, 8589 (2006).
15. D. Oron, E. Tal, and Y. Silberberg, Opt. Express 13, 1468 (2005).
16. G. H. Zhu, J. van Howe, M. Durst, W. Zipfel, and C. Xu, Opt. Express 13, 2153 (2005).
17. H. E. Pudavar, M. P. Joshi, P. N. Prasad, and B. A. Reinhardt, Appl. Phys. Lett. 74, 1338 (1999).
18. A. Diaspro, G. Chirico, C. Usai, P. Ramoino, and J. Dobrucki, in Handbook of Biological Confocal Microscopy, J. B. Pawley, ed., 3rd ed. (Springer, 2006), pp. 690-702.
19. T. J. Farrell, R. P. Hawkes, M. S. Patterson, and B. C Wilson, Appl. Opt. 37, 7168 (1998).
20. H. B. Sun, T. Kawakami, Y. Xu, J. Y. Ye, S. Matuso, H. Misawa, M. Miwa, and R. Kaneko, Opt. Lett. 25, 1110 (2000).
21. "Processing Guidelines for SU-8 2010," (MicroChem Corp., Newton).
22. M. Rumi, J. E. Ehrlich, A. A. Heikal, J. W. Perry, S. Barlow, Z. Y. Hu, D. McCord-Maughon, T. C. Parker, H. Rockel, S. Thayumanavan, S. R. Marder, D. Beljonne, and J. L. Bredas, J. Am. Chem. Soc. 122, 9500 (2000).
23. W. Haske, V. W. Chen, J. M. Hales, W T. Dong, S. Barlow, S. R. Marder, and J. W. Perry, Opt. Express 15, 3426 (2007).