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Volumn 9, Issue 6, 2013, Pages 905-912

Facile and clean release of vertical si nanowires by wet chemical etching based on alkali hydroxides

Author keywords

arrays; field effect transistors; nanowires; oxidation; silicon

Indexed keywords

ALKALI HYDROXIDE; ARRAYS; ASSEMBLING TECHNIQUES; FLEXIBLE PLASTIC SUBSTRATES; METAL-ASSISTED CHEMICAL ETCHING; PROTECTIVE LAYERS; SI NANOWIRES (SINWS); VERTICAL ARRAYS;

EID: 84875258959     PISSN: 16136810     EISSN: 16136829     Source Type: Journal    
DOI: 10.1002/smll.201201804     Document Type: Article
Times cited : (13)

References (32)
  • 1
    • 85013690637 scopus 로고    scopus 로고
    • Elsevier, New York.
    • V. Kumar, Nanosilicon, Elsevier, New York 2008.
    • (2008) Nanosilicon
    • Kumar, V.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.