Ultradense and planarized antireflective vertical silicon nanowire array using a bottom-up technique

Nanoscale Research Letters

Volumn 8, Issue 1, 2013, Pages 1-7

  Dupré, Ludovic ^a   Gorisse, Thérèse ^a,b   Lebranchu, Angélique Letrouit ^a   Bernardin, Thomas ^a   Gentile, Pascal ^a   Renevier, Hubert ^c   Buttard, Denis ^a,d  

^a CEA GRENOBLE   (France)

^b CNRS   (France)

^c LABORATOIRE DES MATÉRIAUX ET DU GÉNIE PHYSIQUE   (France)

^d UNIV GRENOBLE ALPES   (France)

Author keywords

High density; Light trapping; Nanoporous alumina; Silicon nanowires; Universal substrate; Vapor liquid solid

Indexed keywords

ALUMINA; ALUMINUM OXIDE; CRYSTALLINITY; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; LIGHT ABSORPTION; MICROELECTRONIC PROCESSING; MICROELECTRONICS; NANOWIRES; OPTICAL PROPERTIES; SILICON;

LIGHT-TRAPPING; MICROELECTRONIC TECHNIQUES; NANOPOROUS ALUMINA; SILICON NANOWIRE ARRAYS; SILICON NANOWIRES; STRUCTURAL PARAMETER; SYNCHROTRON X RAY DIFFRACTION; VAPOR LIQUID SOLIDS;

SUBSTRATES;

EID: 84875157360     PISSN: 19317573     EISSN: 1556276X     Source Type: Journal    
DOI: 10.1186/1556-276X-8-123     Document Type: Article

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