In situ formation of indium catalysts to synthesize crystalline silicon nanowires on flexible stainless steel substrates by PECVD

Journal of Crystal Growth

Volumn 347, Issue 1, 2012, Pages 7-10

  Xie, Xiaobing ^a   Zeng, Xiangbo ^a   Yang, Ping ^a   Wang, Chao ^a   Wang, Qiming ^a  

^a INSTITUTE OF SEMICONDUCTORS   (China)

Author keywords

A1. Low dimensional structures; A3. Chemical vapor deposition processes; B1. Nanomaterials; B2. Semiconducting silicon

Indexed keywords

CHEMICAL VAPOR DEPOSITION PROCESS; CRYSTALLINE SILICONS; GLASS SUBSTRATES; HYDROGEN PLASMA TREATMENTS; IN-SITU FORMATIONS; INDIUM CATALYST; INDIUM NANOPARTICLES; INTRINSIC SILICON NANOWIRES; LOW DIMENSIONAL STRUCTURE; METAL CATALYST; N TYPE SILICON; PHOSPHORUS ATOM; SILICON NANOWIRES; STAINLESS STEEL SUBSTRATES;

CATALYSTS; CHEMICAL VAPOR DEPOSITION; ELECTRON MICROSCOPY; ENERGY DISPERSIVE SPECTROSCOPY; INDIUM; PLASMA APPLICATIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SINGLE CRYSTALS; SUBSTRATES; VAPORS; X RAY DIFFRACTION;

NANOWIRES;

EID: 84859024878     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2012.03.011     Document Type: Article

References (21)

1. S.J. Tans, M.H. Devoret, R.J.A. Groeneveld, and C. Dekker Nature 394 1998 761
2. A.M. Morales, and C.M. Lieber Science 279 1998 208
3. Z.W. Pan, Z.R. Dai, and Z.L. Wang Science 291 2001 1947
4. Y. Huang, X.F. Duan, Y. Cui, L.J. Lauhon, K.H. Kim, and C.M. Lieber Science 294 2001 1313
5. Y. Cui, Q.Q. Wei, H.K. Park, and C.M. Lieber Science 293 2001 1289
6. B.Z. Tian, X.L. Zheng, T.J. Kempa, Y. Fang, N.F. Yu, G.H. Yu, J.L. Huang, and C.M. Lieber Nature 449 2007 885
7. Y. Cui, Z.H. Zhong, D.L. Wang, W.U. Wang, and C.M. Lieber Nano Letters 3 2003 149
8. Z.G. Wu, J.B. Neaton, and J.C. Grossman Physical Review Letters 100 2008 246804
9. S. Hoffmann, J. Bauer, C. Ronning, T. Stelzner, J. Michler, C. Ballif, V. Sivakov, and S.H. Christiansen Nano Letters 9 2009 1341
10. O. Gunawan, L. Sekaric, A. Majumdar, M. Rooks, J. Appenzeller, J.W. Sleight, S. Guha, and W. Haensch Nano Letters 8 2008 1566
11. L. Hu, and G. Chen Nano Letters 7 2007 3249
12. Y.F. Huang, S. Chattopadhyay, Y.J. Jen, C.Y. Peng, T.A. Liu, Y.K. Hsu, C.L. Pan, H.C. Lo, C.H. Hsu, Y.H. Chang, C.S. Lee, K.H. Chen, and L.C. Chen Nature Nanotechnology 2 2007 770
13. R.S. Wagner, and W.C. Ellis Applied Physics Letters 4 1964 89
14. P.J. Alet, L. Yu, G. Patriarche, S. Palacin, and P.R.I. Cabarrocas Journal of Materials Chemistry 18 2008 5187
15. M. Jeon, and K. Kamisako Materials Letters 62 2008 3903
16. O. Kuboi Japanese Journal of Applied Physics 20 1981 L783
17. P. Aella, S. Ingole, W.T. Petuskey, and S.T. Picraux Advanced Materials 19 2007 2603
18. J. Westwater, D.P. Gosain, S. Tomiya, S. Usui, and H. Ruda Journal of Vacuum Science & Technology B 15 1997 554
19. J. Zhu, Z.F. Yu, G.F. Burkhard, C.M. Hsu, S.T. Connor, Y.Q. Xu, Q. Wang, M. McGehee, S.H. Fan, and Y. Cui Nano Letters 9 2009 279
20. V. Schmidt, J.V. Wittemann, S. Senz, and U. Gosele Advanced Materials 21 2009 2681
21. H. Schmid, M.T. Bjork, J. Knoch, S. Karg, H. Riel, and W. Riess Nano Letters 9 2009 173