Characterization of metal oxide layers grown on CVD graphene

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 31, Issue 2, 2013, Pages

  Matsubayashi, Akitomo ^a   Abel, Joseph ^a   Sinha, Dhiraj Prasad ^a   Lee, Ji Ung ^a   Labella, Vincent P ^a  

^a STATE UNIVERSITY OF NEW YORK   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM DEPOSITION; ALUMINUM OXIDES; CVD GRAPHENE; DIELECTRIC LAYER; ELECTRONIC DEVICE; EX SITU; LOW SURFACE ROUGHNESS; METAL OXIDE LAYERS; OXIDE LAYER; OXIDIZED FILMS; SEED LAYER; ULTRA-HIGH;

ALUMINUM; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; GRAPHENE; METALLIC COMPOUNDS; OXIDATION; STOICHIOMETRY; SURFACE ROUGHNESS; TITANIUM; TITANIUM OXIDES;

ALUMINUM COATINGS;

EID: 84874639042     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.4792068     Document Type: Article

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