Fast electroless fabrication of uniform mesoporous silicon layers

Electrochimica Acta

Volumn 94, Issue , 2013, Pages 57-61

  Li, Xiaopeng ^a,b   Xiao, Yanjun ^c   Yan, Chenglin ^a   Song, Jae Won ^c   Talalaev, Vadim ^a,b   Schweizer, Stefan L ^b   Piekielska, Katarzyna ^b   Sprafke, Alexander ^b   Lee, Jung Ho ^c   Wehrspohn, Ralf B ^b,d  

^a MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

^b MARTIN LUTHER UNIVERSITY HALLE WITTENBERG   (Germany)

^c Hanyang University   (South Korea)

^d FRAUNHOFER INSTITUTE FOR MECHANICS OF MATERIALS IWM   (Germany)

Author keywords

Mesoporous Si; Metal assisted chemical etching; Pt nanoparticle

Indexed keywords

CHEMICAL ETCHING; LAYER TRANSFER; MESOPOROUS; MESOPOROUS SILICON; METAL-ASSISTED CHEMICAL ETCHING; OPTIMIZED CONDITIONS; PT NANOPARTICLES; STAIN ETCHING;

CHARGE TRANSFER; MESOPOROUS MATERIALS; METAL NANOPARTICLES; PLATINUM;

SILICON;

EID: 84874030830     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2013.01.136     Document Type: Article

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