The fabrication of tunable nanoporous oxide surfaces by block copolymer lithography and atomic layer deposition

Nanotechnology

Volumn 22, Issue 33, 2011, Pages

  Andreozzi, A ^a   Lamagna, L ^a   Seguini, G ^a   Fanciulli, M ^a,c   Schamm Chardon, S ^b   Castro, C ^b   Perego, M ^a  

^a LABORATORIO MDM   (Italy)

^b UNIVERSITÉ DE TOULOUSE   (France)

^c UNIVERSITY OF MILANO BICOCCA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

BLOCK COPOLYMER LITHOGRAPHY; BOTTOM UP APPROACH; FEATURE SIZES; MATRIX; METHYL METHACRYLATES; NANO-METER-SCALE; NANO-POROUS; NANO-POROUS OXIDE; NANO-SCALE MATERIALS; NANO-STRUCTURED; NANOELECTRONIC DEVICES; NANOMETER PRECISION; POLYMERIC MASKS; THIN OXIDE FILMS;

ALUMINUM; ATOMIC LAYER DEPOSITION; BLOCK COPOLYMERS; BORON CARBIDE; COPOLYMERIZATION; DEPOSITION; FABRICATION; LITHOGRAPHY; NANOELECTRONICS; NANOPORES; POLYMERIC FILMS; POLYSTYRENES; REACTIVE ION ETCHING; SILICON COMPOUNDS; SURFACES;

OXIDE FILMS;

EID: 79961055811     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/22/33/335303     Document Type: Article

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