Postcoalescence evolution of growth stress in polycrystalline films

Physical Review Letters

Volumn 110, Issue 5, 2013, Pages

  Gonzalez Gonzalez A ^a   Polop, C ^b   Vasco, E ^a  

^a INSTITUTO DE CIENCIA DE MATERIALES DE MADRID   (Spain)

^b UNIVERSIDAD AUTÓNOMA DE MADRID   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPIC GRAINS; ATOMIC VIBRATION; DEPOSITION CONDITIONS; DEPOSITION TIME; DIFFUSION TIME; DYNAMIC SCALING; EXPERIMENTAL EVIDENCE; FINITE ELEMENT MODELING; FLUX DEPENDENCE; GROWTH STRESS; MESOSCOPICS; MORPHOLOGY CHANGES; POLYCRYSTALLINE FILM; RATE EQUATION APPROACH; SPACE SCALE; SURFACE STRESS; TIME-SCALES;

DEPOSITION; STRESS RELAXATION; TIME MEASUREMENT;

GRAIN GROWTH;

EID: 84873161016     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.110.056101     Document Type: Article

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