Stress and microstructure evolution in Al-induced crystallization of amorphous Ge thin films

Thin Solid Films

Volumn 520, Issue 2, 2011, Pages 708-711

  Zhang, Weilin ^a   Ma, Fei ^a   Zhang, Tianwei ^a   Xu, Kewei ^a  

^a XI'AN JIAOTONG UNIVERSITY   (China)

Author keywords

Crystallization; Stress; Thin film

Indexed keywords

CRITICAL TEMPERATURES; GE THIN FILMS; IN-SITU; IN-SITU X-RAY DIFFRACTION; METAL-INDUCED CRYSTALLIZATION; MICROSTRUCTURE CHARACTERIZATION; MICROSTRUCTURE EVOLUTIONS; MULTIBEAM OPTICAL STRESS SENSORS; STRESS EVOLUTION; STRESS GENERATION;

ALUMINUM; AMORPHOUS FILMS; GERMANIUM; MICROSTRUCTURE; SENSORS; THIN FILMS; X RAY DIFFRACTION;

CRYSTALLIZATION;

EID: 80755140664     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.01.398     Document Type: Conference Paper

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