Noise properties of ZnO nanowalls deposited using rapid thermal evaporation technology

IEEE Photonics Technology Letters

Volumn 25, Issue 3, 2013, Pages 213-216

  Chen, T P ^a   Hung, F Y ^a   Chang, S P ^a   Chang, S J ^a   Wu, S L ^b   Hu, Z S ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b CHENG SHIU UNIVERSITY   (Taiwan)

Author keywords

Flicker noise; low temperature; nanowalls; ultraviolet (UV); ZnO

Indexed keywords

FLICKER NOISE; LOW TEMPERATURES; NANOWALLS; ULTRA-VIOLET; ZNO;

PHOTOLUMINESCENCE; SPURIOUS SIGNAL NOISE; SUBSTRATES; TEMPERATURE; THERMAL EVAPORATION; ULTRAVIOLET DEVICES;

ZINC OXIDE;

EID: 84872736493     PISSN: 10411135     EISSN: None     Source Type: Journal    
DOI: 10.1109/LPT.2012.2233731     Document Type: Article

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